Preparation method of surface enhanced Raman scattering substrate
A surface-enhanced Raman and substrate technology, which is applied in the process of producing decorative surface effects, manufacturing microstructure devices, decorative arts, etc., can solve the problems of poor repeatability of measurement results, complicated methods, and high cost, and achieve easy-to-use large-area Preparation, simple method, effect of changing Raman scattering effect
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[0012] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with specific embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, and are not intended to limit the present invention.
[0013] This specific embodiment adopts the following technical solutions:
[0014] A method for preparing a surface-enhanced Raman scattering substrate. The specific steps are: using electron beam evaporation technology to deposit metal gallium with an equivalent thickness of 100 nanometers on the surface of a cleaned silicon wafer, the substrate temperature is 50 degrees, and the vacuum degree is 4x10 -4 Pa, after the deposition, the sample is annealed in an air atmosphere in a muffle furnace, the annealing temperature is 400-500 degrees, and the annealing time is 4-5 minutes. After the reaction, a l...
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Abstract
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