Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A kind of go/sio 2 Preparation method of modified nanocomposite film

A nano-composite and thin-film technology, applied in the field of nano-composite thin film preparation, can solve the problems of easy agglomeration and easy pollution of NF membrane, and achieve the effects of enhanced thermal stability, increased hydrophilicity, and good thermo-mechanical stability.

Active Publication Date: 2020-06-09
JIANGSU UNIV
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to overcome the defective that exists in the prior art, as improving the water flux that IP method prepares NF membrane; Overcome NF membrane easy pollution; Improve the thermal stability of NF membrane; Problems such as material doping modification and easy agglomeration

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A kind of go/sio <sub>2</sub> Preparation method of modified nanocomposite film
  • A kind of go/sio <sub>2</sub> Preparation method of modified nanocomposite film
  • A kind of go/sio <sub>2</sub> Preparation method of modified nanocomposite film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] (1) Preparation of polysulfone ultrafiltration membrane:

[0032]Mix 18g PSF and 2g PVP in 80g DMF respectively, stir the blended system at 60°C for 5h to dissolve into a homogeneous solution, and let it stand at room temperature for 12h to defoam to obtain a casting solution. Use a self-made scraper to scrape the casting solution on the glass plate to form a film by casting method, and quickly put it into the prepared coagulation bath for phase separation and forming (the ratio of the coagulation bath is: distilled water 2000g, dodecyl SDS5g, DMF20g ), after soaking for 30min, take it out and rinse with a large amount of distilled water, and store it in distilled water. The thickness of the prepared PSF ultrafiltration membrane is about 200 μm. The rejection rate of the prepared PSF ultrafiltration membrane is more than 90%, reaching the standard of ultrafiltration membrane.

[0033] Among them, PVP is used as a porogen; SDS in the coagulation bath is used as a surfa...

Embodiment 2

[0039] (1) Preparation of polysulfone ultrafiltration membrane:

[0040] Mix 18g PSF and 2g PVP in 80g DMF respectively, stir the blended system at 60°C for 5h to dissolve into a homogeneous solution, and let it stand at room temperature for 12h to defoam to obtain a casting solution. Use a self-made scraper to scrape the casting solution on the glass plate to form a film by casting method, and quickly put it into the prepared coagulation bath for phase separation and forming (the ratio of the coagulation bath is: distilled water 2000g, dodecyl SDS5g, DMF20g ), after soaking for 30min, take it out and rinse with a large amount of distilled water, and store it in distilled water. The thickness of the prepared PSF ultrafiltration membrane is about 200 μm. The rejection rate of the prepared PSF ultrafiltration membrane is more than 90%, reaching the standard of ultrafiltration membrane.

[0041] (2) Preparation of graphene oxide / silica composite nanomaterials (GO / SiO 2 ):

[...

Embodiment 3

[0048] (1) Preparation of polysulfone ultrafiltration membrane:

[0049] Take 15g PSF and 5g PVP and mix them in 80g DMF respectively, stir the blended system at 60°C for 5h to dissolve into a homogeneous solution, and let it stand at room temperature for 12h to defoam to obtain a casting solution. Use a self-made scraper to scrape the casting solution on the glass plate to form a film by casting method, and quickly put it into the prepared coagulation bath for phase separation and forming (the ratio of the coagulation bath is: distilled water 2000g, dodecyl SDS5g, DMF20g ), after soaking for 30min, take it out and rinse with a large amount of distilled water, and store it in distilled water. The thickness of the prepared PSF ultrafiltration membrane is about 100 μm. The rejection rate of the prepared PSF ultrafiltration membrane is more than 90%, reaching the standard of ultrafiltration membrane.

[0050] (2) Preparation of graphene oxide / silica composite nanomaterials (GO / ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
pore sizeaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention belongs to the technical field of material preparation and separation, in particular to a preparation method for GO / SiO2 modified nanocomposite film. The preparation method comprises thefollowing steps: firstly, mixing polysulfone (PSF), polyvinylpyrrolidone (PVP) in N,N dimethylformamide, preparing polysulfone ultrafiltration membrane by adopting a flow casting method, preparing graphene oxide / silicon dioxide nanocomposite GO / SiO2 from GO, ethanol solution, ammonium hydroxide and tetraethyl orthosilicate; pouring a piperazine / water solution containing GO / SiO2 and 1,3,5-trimesoyl chloride / hexane solution on the surface of the membrane; performing thermal treatment and washing to obtain GO / SiO2 modified nanocomposite film. The GO / SiO2 modified nanocomposite film has high thermal stability, protein pollution resistance is improved remarkably; hydrophilicity of the functional film is improved; the Nano SiO2 containing the nanocomposite film is increased in the interlayer spacing of GO, the film flux is increased greatly, so that the film can be expected to be applied to industrial water treatment.

Description

technical field [0001] The invention belongs to the technical field of material preparation and separation, in particular to a GO / SiO 2 Preparation of modified nanocomposite films. Background technique [0002] Nanofiltration (NF) is a new membrane separation technology that emerged in the 1980s. The pore size of NF membrane is about 0.5-2nm, and its operating pressure is between ultrafiltration (UF) and reverse osmosis (RO). It is called "dense UF membrane" or "loose RO membrane". Due to the high-efficiency separation of multivalent salts and small molecular weight solutes (Mw between 200 and 1000 Da) at relatively low operating pressure, NF membranes are widely used in many industrial applications such as sewage treatment, seawater desalination, food processing and bioseparation. middle. At present, the preparation methods of NF membranes are mainly divided into phase inversion method and composite method. Although the phase inversion method is easier to operate than th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): B01D71/68B01D69/12B01D69/02B01D67/00B01D61/02
CPCB01D61/027B01D67/0079B01D69/02B01D69/12B01D71/68B01D2325/36
Inventor 刘建益刘燕杨荣光孟敏佳
Owner JIANGSU UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com