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Method for growing single crystal diamond using mpvd method based on hair as carbon source

A single crystal diamond and single crystal growth technology, which is applied in metal material coating process, coating, gaseous chemical plating, etc., can solve the problem of expensive methane gas, improve cost performance, increase utilization rate, and reduce deposition time Effect

Active Publication Date: 2019-12-17
WUHAN INSTITUTE OF TECHNOLOGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] Based on this, in view of the limitations existing in the above, the existing problems such as the high price of methane gas, there is an urgent need for a diamond with low cost and good production quality.

Method used

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  • Method for growing single crystal diamond using mpvd method based on hair as carbon source
  • Method for growing single crystal diamond using mpvd method based on hair as carbon source

Examples

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Effect test

example 1

[0026] In the first step, the first microwave plasma chemical vapor deposition device 6 and the second microwave plasma chemical vapor deposition device 6 are respectively connected with the vacuum pump 1 and the vacuum pump 2 through vacuum pipelines, and the first microwave plasma chemical vapor deposition device 6 It is connected with the second microwave plasma chemical vapor deposition device 6 and communicated with the purification device 3 through the vacuum pipeline 4 .

[0027] In the second step, the hair strands are woven into hair strands with a diameter of 1-2 mm, inserted into the sockets on the fixed sample stage in turn, and the fixed sample stage with the hair strands inserted is put into the first microwave plasma chemical vapor deposition device 1 In the reaction chamber of the first microwave plasma chemical vapor deposition device 1, the hydrogen gas with a purity of 99.999% is passed from the hydrogen gas bottle into the reaction chamber of the first micro...

example 2

[0032] In the first step, the first microwave plasma chemical vapor deposition device 6 and the second microwave plasma chemical vapor deposition device 6 are respectively connected with the vacuum pump 1 and the vacuum pump 2 through vacuum pipelines, and the first microwave plasma chemical vapor deposition device 6 It is connected with the second microwave plasma chemical vapor deposition device 6 and communicated with the purification device 3 through the vacuum pipeline 4 .

[0033] In the second step, the hair strands are woven into hair strands with a diameter of 1-2 mm, inserted into the sockets on the fixed sample stage in turn, and the fixed sample stage with the hair strands inserted is put into the first microwave plasma chemical vapor deposition device 1 In the reaction chamber of the first microwave plasma chemical vapor deposition device 1, the hydrogen gas with a purity of 99.999% is passed from the hydrogen gas bottle into the reaction chamber of the first micro...

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Abstract

The invention discloses a method for growing monocrystal diamond through a microwave plasma chemical vapor deposition (MPCVD) method based on hair as a carbon source. The method includes the followingsteps that firstly, a synthesizer for producing the monocrystal diamond and a sample fixing table are provided; secondly, a bundle of hair is inserted into an inserting opening in the sample fixing table, the sample fixing table is put into a reaction cavity, hydrogen is introduced into the cavity to form plasmas, and the plasmas are used for firing the hair to gasify the hair; thirdly, the gasified gas is collected, purified and then introduced to another reaction cavity; and fourthly, deposition of the monocrystal diamond is finished. According to the method, the hair is fired to be gasified through the MPCVD method, the monocrystal diamond is produced through the carbon source of the hair, and the monocrystal diamond with good quality is obtained.

Description

technical field [0001] The invention relates to the field of diamond synthesis, in particular to a method for growing single crystal diamond by using MPCVD method based on hair as a carbon source. Background technique [0002] Diamond is the hardest substance in nature composed of carbon elements. It has many excellent characteristics, such as high band gap, high carrier mobility, and excellent thermal conductivity. It is widely used in military and aerospace fields. Many uses. Hair is mainly composed of protein, and protein contains a lot of carbon elements, which can provide a carbon source for preparing diamonds. At present, the carbon source for synthesizing single crystal diamond by MPCVD method is methane gas, which is expensive, and hair is common in daily life. Raw materials are cheap and highly available. At present, there is no method for burning hair strands to obtain carbon source by microwave plasma chemical vapor deposition. [0003] Based on this, in view o...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/27C23C16/517
CPCC23C16/274C23C16/276C23C16/517
Inventor 马志斌夏禹豪
Owner WUHAN INSTITUTE OF TECHNOLOGY
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