High-glass-transition-temperature hole injection material and preparation method and application thereof
A technology of hole injection material and transition temperature, which is applied in the preparation of organic compounds, preparation of amino hydroxyl compounds, organic chemistry, etc., can solve the problem of low glass transition temperature, high material solubility requirements, and insufficient thermal stability. OLED device application requirements and other issues, to achieve the effect of simple method, good solubility, and good hole transport ability
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[0054] The structural formula of the hole injection material of this embodiment is specifically as follows:
[0055]
[0056] The preparation method of the hole injection material XL1 with a high glass transition temperature in this embodiment includes the following steps:
[0057] Step 1: Preparation of 6-bromo-N,N-bis(4-methoxyphenyl)-2-naphthylamine (compound 1), the reaction equation is as follows:
[0058]
[0059] Dissolve p-iodoanisole (15g, 0.064mol) and 6-bromo-2-naphthylamine (3.3g, 0.015mol) in 120ml of anhydrous toluene, and quickly add CuI (0.89g, 4.67mmol) under nitrogen atmosphere, 1,10-Phenanthroline (1.232g, 6.83mmol) and sodium tert-butoxide (7g, 75mmol) were heated to 120°C, reacted for about 48h, concentrated to remove toluene, added dichloromethane and distilled water for extraction (dichloromethane and The volume ratio of distilled water is 1:1), the organic layer is dried over anhydrous magnesium sulfate, filtered, concentrated under reduced press...
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