Gallium nitride heterojunction bidirectional switching device
A bidirectional switching device, gallium nitride technology, applied in the direction of semiconductor devices, semiconductor/solid-state device manufacturing, electrical components, etc., can solve the problems of device surface oxidation, process incompatibility, surface state generation, etc., to achieve low on-resistance, High utilization rate of chip area, avoiding the effect of being oxidized
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[0019] Below in conjunction with accompanying drawing, describe technical scheme of the present invention in detail:
[0020] like figure 2 As shown, the gallium nitride heterojunction bidirectional switch device of the present invention includes a substrate 1, a GaN layer 2 and an InAlN layer 3 which are sequentially stacked from bottom to top, and the GaN layer 2 and the InAlN layer 3 form a heterojunction; The two ends of the device are respectively a Schottky source structure 4 and a Schottky drain structure 5 formed by a metal with a low work function in direct contact with the InAlN layer 3; There are two insulated gate structures (a first insulated gate structure and a second insulated gate structure) between the base-drain structure 5; the two insulated gate structures are respectively close to the Schottky source structure 4 and the Schottky drain structure 5, and keep a certain distance from the Schottky source structure 4 and the Schottky drain structure 5, and th...
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