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Photosensitive resin composition and color filter comprising the photosensitive resin composition

A technology of photosensitive resin and composition, applied in the field of photosensitive resin composition, can solve the problems of color filter color purity, limited brightness and contrast, and limited degree of freedom, etc., to reduce sensitivity, improve brightness, and excellent solvent resistance Effect

Active Publication Date: 2020-06-30
LG CHEM LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Efforts are being made to improve brightness and contrast through ultrafine particle size and dispersion stabilization of pigments, but the degree of freedom is limited in the selection of colorants to achieve color coordinates for display devices with high color purity
In addition, the use of colorants that have been developed, especially the pigment dispersion method of pigments, is limited for improving the color purity, brightness and contrast of color filters using it

Method used

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  • Photosensitive resin composition and color filter comprising the photosensitive resin composition
  • Photosensitive resin composition and color filter comprising the photosensitive resin composition
  • Photosensitive resin composition and color filter comprising the photosensitive resin composition

Examples

Experimental program
Comparison scheme
Effect test

experiment example

[0199] Examples 1 to 4 and Comparative Examples 1 to 3 were produced according to the ratios shown in Table 1 below. The charging unit for each composition is grams (g).

[0200] [Table 1]

[0201]

experiment example 1

[0202] Experimental Example 1. Measurement of Film Reduction

[0203] The above-mentioned photosensitive resin composition was spin-coated on glass (5 cm×5 cm), and prebake was performed at 110° C. for 70 seconds to form a film. Irradiate 30mJ / cm to the whole surface of the substrate 2 exposure. After removing the film layer in the center portion of the substrate, the level difference was confirmed using a surface level difference measuring device.

[0204] Thereafter, the exposed substrate was developed at 0.1 mPa for 55 seconds with a developing solution (KOH, 0.04%), and the level difference was confirmed using a surface level difference measuring device.

[0205] The height difference before and after image development was confirmed, and the degree of film reduction was determined and shown in Table 2 below.

experiment example 2

[0206] Experimental example 2. Evaluation of peeling

[0207] The above-mentioned photosensitive resin composition was spin-coated on glass (5 cm×5 cm), and prebake was performed at 110° C. for 70 seconds to form a film. The distance between the substrate on which the film was formed and the photo-mask was 600 μm, and the entire surface of the substrate was irradiated with 30 mJ / cm 2 exposure. Then, after developing the exposed substrate with a developer (KOH, 0.04%) at 0.2 mPa for 300 seconds, the pattern was observed with an Olympus optical microscope, and the degree of pattern peeling was confirmed. The degree of peeling is shown in the attached figure 1 .

[0208] [Table 2]

[0209] Membrane cut (um) Comparative Example 1 0.038 Comparative Example 2 0.041 Comparative Example 3 0.039 Example 1 0.008 Example 2 0.007 Example 3 0.010 Example 4 0.009

[0210] Table 2 above and appendix figure 1 As shown, it was fou...

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Abstract

The present invention provides a photosensitive resin composition and a color filter including the photosensitive resin composition. The present specification relates to a photosensitive resin composition including a compound represented by Chemical Formula 1 and a compound represented by Chemical Formula 2, and a color filter including the photosensitive resin composition. Chemical formula 1 Chemical formula 2

Description

technical field [0001] The present specification relates to a photosensitive resin composition and a color filter containing the photosensitive resin composition. Background technique [0002] In recent years, performances characterized by high brightness and high contrast have been required for color filters. In addition, one of the main purposes of developing a display element is to differentiate the performance of the display element by improving the color purity and to improve the yield in the manufacturing process. [0003] Conventionally, since the type of pigment used as a colorant of a color filter exists in a color photoresist in a particle-dispersed state, it is difficult to adjust the brightness and contrast ratio by adjusting the size and distribution of the pigment particles. In the case of pigment particles, they aggregate in the color filter, resulting in poor solubility and dispersibility, and large particles formed by aggregation cause multiple scattering o...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/004G03F7/033G02B5/20
CPCG02B5/20G03F7/004G03F7/033C07D311/82C09B1/16C09B11/04G02B5/223G02F1/133514G03F7/0048G03F7/027G03F7/028G03F7/032G03F7/105
Inventor 李修莲梁承秦柳璋铉李多美朴锺镐朴相均金载骏李在容
Owner LG CHEM LTD
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