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Nickel-supported hydrophobic SiO2 composite film and production method thereof

A loaded, hydrophobic technology, applied in separation methods, chemical instruments and methods, membranes, etc., can solve problems such as poor hydrothermal stability, and achieve improved hydrothermal stability, increased permeation rate, and improved water vapor stability. Effect

Inactive Publication Date: 2017-12-08
XI'AN POLYTECHNIC UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The object of the invention is to provide a nickel-loaded hydrophobic SiO 2 Composite Membranes, Solving the Common Hydrophilic SiO 2 The problem of poor hydrothermal stability of the membrane

Method used

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  • Nickel-supported hydrophobic SiO2 composite film and production method thereof
  • Nickel-supported hydrophobic SiO2 composite film and production method thereof

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preparation example Construction

[0037] Nickel-loaded hydrophobic SiO prepared by the preparation method of the present invention 2 Composite film, in the enhanced SiO 2 Based on the water vapor stability of the membrane, the H 2 The permeation rate and H 2 / CO 2 Separation factor, after aging in a water vapor environment, H 2 Permeation rate decreased only slightly, H 2 / CO 2 On the contrary, the separation factor increases, and the hydrothermal stability is effectively improved.

[0038] A kind of nickel-loaded hydrophobic SiO of the present invention 2 The effect of each component that adds in the preparation method of composite film: tetraethyl orthosilicate (TEOS) is as silicon source; Methyltriethoxysilane (MTES) is as hydrophobic modifier, replaces part tetraethyl orthosilicate, Preparation of methyl-modified SiO by cohydrolytic condensation reaction of both 2 film; absolute ethanol (EtOH) was used as a solvent on the one hand, and also a product of polycondensation reaction on the other hand; ...

Embodiment 1

[0042] Step 1, take the following components respectively according to mass percentage:

[0043] Tetraethyl orthosilicate 24.12%, methyltriethoxysilane 16.72%, absolute ethanol 41.63%, water 15.21%, HNO 3 0.63%, Ni(NO 3 ) 2 ·6H 2 O 1.68%, the sum of the mass percentages of the above components is 100%;

[0044] Step 2. Stir vigorously the ethyl orthosilicate, methyltriethoxysilane, and absolute ethanol weighed in step 1 in an ice-water bath for 45 minutes to mix them evenly to prepare a mixed solution;

[0045] Step 3, add dropwise the water weighed in step 1, dilute HNO to the mixed solution obtained in step 2 while stirring 3 and Ni(NO 3 ) 2 ·6H 2 The homogeneous mixed solution prepared by O solid was stirred and refluxed at 50 °C for 5 h after the dropwise addition, and cooled naturally to room temperature to obtain the original Ni / SiO 2 Sol;

[0046] Step 4, add the mixture of drying control agent and absolute ethanol to the original Ni / SiO in step 3 while stirri...

Embodiment 2

[0050] Step 1, take the following components respectively according to mass percentage:

[0051] Tetraethyl orthosilicate 22.41%, methyltriethoxysilane 16.30%, absolute ethanol 42.69%, water 15.49%, HNO 3 0.61%, Ni(NO 3 ) 2 ·6H 2 O 2.50%, the sum of the mass percentages of the above components is 100%;

[0052] Step 2. Stir vigorously the ethyl orthosilicate, methyltriethoxysilane, and absolute ethanol weighed in step 1 in an ice-water bath for 45 minutes to mix them evenly to prepare a mixed solution;

[0053] Step 3, add dropwise the water weighed in step 1, dilute HNO to the mixed solution obtained in step 2 while stirring 3 and Ni(NO 3 ) 2 ·6H 2 The homogeneous mixed solution prepared by O solid was stirred and refluxed at 60 °C for 3 h after the dropwise addition, and cooled naturally to room temperature to obtain the original Ni / SiO 2 Sol;

[0054] Step 4, add the mixture of drying control agent and absolute ethanol to the original Ni / SiO in step 3 while stirri...

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Abstract

The invention discloses a nickel-supported hydrophobic SiO2 composite film comprising following components in percentage by mass: 14.83% to 24.12% of tetraethylorthosilicate, 15.23% to 16.72% of methyltriethoxysilane, 41.63% to 49.87% of absolute ethanol, 15.21% to 15.38% of water, 0.54% to 0.63% of HNO3 and 1.68% to 4.14% of Ni(NO3)2.6H2O, wherein the sum of the mass percentage of the components above is 100%. The invention can solve a problem in the prior art that the permeation rate and the separation factor of an existing common SiO2 film gas is difficult to increase at the same time; and a production method of the nickel-supported hydrophobic SiO2 composite film, disclosed by the invention, can be used for increasing the permeation rate of H2 and a H2 / CO2 separation factor at the same time on the basis of improving the water vapor stability of a SiO2 film.

Description

technical field [0001] The invention belongs to the technical field of gas separation membranes, and relates to a nickel-loaded hydrophobic SiO 2 Composite membrane, the present invention also relates to this nickel-loaded hydrophobic SiO 2 Preparation method of composite membrane. Background technique [0002] As we all know, CO 2 It is the largest greenhouse gas emission, and it is the focus of greenhouse gas reduction and control. CO 2 The main source of emissions is the use of fossil fuels, especially the burning of coal. while H 2 It is a clean energy with great development prospects. At present, it has even been proposed in the world to efficiently and intensively convert heavily polluted coal into clean hydrogen for combustion, that is, coal gasification to produce hydrogen, and the separated high-concentration CO 2 Transported to designated locations for storage to reduce greenhouse gas CO 2 emissions. In the process of coal gasification hydrogen production,...

Claims

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Application Information

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IPC IPC(8): B01D69/02B01D69/12B01D69/10B01D67/00B01D71/02B01D53/22C01B3/50
CPCB01D53/228B01D67/0048B01D69/02B01D69/10B01D69/12B01D71/027B01D2325/22B01D2325/38C01B3/503Y02C20/40Y02P20/151
Inventor 杨靖贾德宝
Owner XI'AN POLYTECHNIC UNIVERSITY
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