Procedure sequence control method and apparatus
A technology of process sequence and control method, applied in the direction of program control, computer control, general control system, etc., can solve the problems of long waiting time, reduced experimental efficiency, and delayed experimental progress, so as to shorten the waiting time and ensure the processing progress. , the effect of improving experimental efficiency
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[0093] refer to image 3 , shows a schematic structural diagram of an example of an embodiment of the present invention applied to a silicon wafer etching machine. Depend on image 3 It can be seen that the silicon wafer etching machine includes a plurality of processing equipment, mainly including:
[0094] 3 silicon wafers loaded in the container (Load Port): each silicon wafer loaded in the container includes multiple container slots, and each container slot can hold a single silicon wafer;
[0095] 1 atmospheric manipulator (ATM Robot): the device responsible for transferring silicon wafers from the Load Port and Load Lock;
[0096] 2 wafer cache chambers (Load Lock): the device responsible for caching the silicon wafers transferred from the Load Port, of which the 2 Load Locks are parallel devices that can cache the built-in silicon wafers at the same time;
[0097] 1 vacuum robot (VAC Robt): the device responsible for transferring silicon wafers from the Load Lock and...
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