Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

ETFE (ethylene-tetrafluoroethylene copolymer) film and preparation method thereof

A thin film and additive technology, which is applied in the field of ETFE thin film and its preparation, can solve the problems that thin film technology is difficult to master, and achieve the effects of strong practical value, super insulation and low thermal resistance

Inactive Publication Date: 2017-10-24
HUANGHE S & T COLLEGE
View PDF3 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] However, it is difficult to master the technology of mixing ETFE particle raw materials with additives to make a film with uniform thickness, sufficient raw material dissolution, good performance and no wrinkles.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • ETFE (ethylene-tetrafluoroethylene copolymer) film and preparation method thereof
  • ETFE (ethylene-tetrafluoroethylene copolymer) film and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] The following raw materials are calculated in parts by weight:

[0026] 100 parts of ETFE;

[0027] 10 parts of PFA;

[0028] 0.5 parts of graphene;

[0029] Among them, the melt index of ETFE is 20.

[0030] Step 1, add above-mentioned ETFE, PFA, graphene to high mixer and fully mix;

[0031] Step 2, granulating the above-mentioned mixture to make granules;

[0032] Step 3, adding the above granules to a screw extruder, heating to 190-210°C, melting and extruding, forming a film through a flat mold;

[0033] Step 4, cooling the formed film at 90-100°C by a cooling roller, and drying in vacuum;

[0034] Step 6, trimming and winding to obtain the ETFE film.

[0035] The film product has a thickness of 50 μm, a width of 550 mm, a transparent color and a bright surface.

Embodiment 2

[0037] The following raw materials are calculated in parts by weight:

[0038] 100 parts of ETFE;

[0039] 10 parts of PFA;

[0040] PVDF 10 parts;

[0041] PMMA 10 parts;

[0042] 2.5 parts of graphene;

[0043] Among them, the melt index of ETFE is 25.

[0044] Weigh the raw materials of the above formula, and make a film according to the method described in Example 1; the film product has a thickness of 50 μm, a width of 550 mm, a transparent color, and a bright surface, which can be used as a semiconductor release film.

Embodiment 3

[0046] The following raw materials are calculated in parts by weight:

[0047] 100 parts of ETFE;

[0048] PMMA 10 parts;

[0049] 2 parts of graphene;

[0050] Among them, the melt index of ETFE is 22.

[0051] Weigh the raw materials of the above formula, and make a film according to the method described in Example 1; the film product has a thickness of 50 μm, a width of 550 mm, and a transparent color.

[0052] Table 1: Basic properties of the film products obtained in the above-mentioned embodiments 1-3

[0053]

[0054]

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Thicknessaaaaaaaaaa
Widthaaaaaaaaaa
Login to View More

Abstract

The invention discloses an ETFE (ethylene-tetrafluoroethylene copolymer) film and a preparation method thereof. The film is prepared from the ETFE and an additive, wherein the processing temperature is 190 to 210 DEG C; the user amount ratio of the ETFE to the additive is 1:(10-20) percent according to the percentage by weight; the melt index of the ETFE is 20 to 25; and the functional additive comprises more than any one of the conventional fluoroplastic additive and the conventional engineering additive as well as graphene. The ETFE film provided by the invention has high thermal radiation ratio, high heat conductivity and low heat resistance value, has self-cleaning property, acid and alkali resistance and ultrahigh insulativity while cooling, and has strong practical value.

Description

technical field [0001] The invention relates to an industrial film, in particular to an ETFE film and a preparation method thereof. Background technique [0002] ETFE is the abbreviation of Ethylene-tetrafluoroethylene copolymer in English. The Chinese name is ethylene-tetrafluoroethylene copolymer (ETFE), commonly known as fluoroplastic resin. It is a colorless and transparent particle formed by copolymerization of tetrafluoroethylene and ethylene in a certain proportion. Crystalline, with excellent scratch resistance and wear resistance, high temperature resistance, chemical resistance, good insulation properties of fluoroplastics. [0003] ETFE is the strongest fluoroplastic. While maintaining the good heat resistance, chemical resistance and electrical insulation properties of PTFE, it has greatly improved its radiation resistance and mechanical properties. The tensile strength can reach 50MPa, which is close to poly 2 times that of tetrafluoroethylene. [0004] With t...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C08L23/08C08L27/18C08L27/16C08L33/12C08K3/04
CPCC08L23/0892C08J5/18C08J2323/08C08L2203/16C08L2205/035C08L27/18C08K3/04C08L27/16C08L33/12
Inventor 张具琴柴远波乐丽琴李伟
Owner HUANGHE S & T COLLEGE
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products