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A multi-source oblique insertion plasma gas processing device

A gas treatment and plasma technology, applied in gas treatment, separation methods, dispersed particle separation, etc., can solve the problems of weak gas flow rate tolerance, low treatment efficiency, complex structure, etc., to improve tolerance, simple maintenance, Improve the effect of processing

Active Publication Date: 2019-12-27
中控全世科技(杭州)有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
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AI Technical Summary

Problems solved by technology

[0008] The invention provides a multi-source obliquely inserted plasma gas processing device. A multi-source obliquely inserted structure is formed by obliquely inserting a plurality of plasma sources into the cavity of the gas processing area, and the multi-source obliquely inserted structure solves the problem of The traditional plasma devices have problems such as weak gas flow capacity, low processing efficiency, poor efficiency, and complex structure.

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  • A multi-source oblique insertion plasma gas processing device
  • A multi-source oblique insertion plasma gas processing device
  • A multi-source oblique insertion plasma gas processing device

Examples

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Embodiment Construction

[0032] Below in conjunction with specific embodiment, further illustrate the present invention. It should be understood that these examples are only used to illustrate the present invention, not to limit the protection scope of the present invention. Improvements and adjustments made by those skilled in the art according to the present invention in practical applications still belong to the protection scope of the present invention.

[0033] In order to better illustrate the present invention, the present invention will be described in detail below in conjunction with the accompanying drawings.

[0034] Such as figure 1 As shown, a multi-source obliquely inserted plasma gas treatment device of the present invention includes an intake channel 1, a deceleration chamber 2, a gas treatment area 4, an exhaust absorption device 5 and a plasma source 3. The gas treatment The upper end 4 of the zone is sequentially connected with the deceleration chamber 2 and the air intake channel...

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Abstract

The present invention discloses a multi-source obliquely-inserting type plasma gas treatment apparatus, which comprises a gas inlet channel, a deceleration chamber, a gas treatment zone, a gas discharging absorption device and plasma sources, wherein the upper end of the gas treatment zone is sequentially connected to the deceleration chamber and the gas inlet channel, the lower end of the gas treatment zone is connected to the gas discharging absorption device, the gas treatment zone comprises a plurality of gas treatment chambers connected in a layered manner, plural rows of plasma source inserting ports communicated to the gas treatment chamber are arranged along the circumferential directions of each gas treatment chamber, the plasma source inserting ports are respectively provided with the plasma sources, and the included angle formed between the axial line of the plasma source and the center axis of the gas treatment chamber is an acute angle. According to the present invention, in the case of the large flow rate gas inlet, the plurality of the plasma sources simultaneously work, and each plasma can be fully contact the gas to be treated, such that the gas treatment effect and the gas treatment efficiency of the plasma are substantially improved; and the multi-source obliquely-inserting type plasma gas treatment apparatus has advantages of simple structure, high spatial utilization rate, easy maintenance, and easy repair.

Description

technical field [0001] The invention belongs to the technical field of gas treatment and air purification, and in particular relates to a multi-source obliquely inserted plasma gas treatment device. Background technique [0002] With the rapid development of my country's industry, the level of air pollution across the country is becoming increasingly severe, and most areas often experience large-scale smog. At present, the main air purification methods and technologies mainly include liquid absorption method, adsorption method, thermal oxidation, biological treatment method, condensation method and plasma technology. Among them, the principle of plasma technology to achieve air purification is as follows: [0003] (1) Through collisions, high-energy electrons transfer energy to other particles, and other particles that obtain energy are excited, and some particles are also ionized into active groups; [0004] (2) The active group transitions from the high-energy excited sta...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B01D53/74
CPCB01D53/74B01D2258/06B01D2259/818
Inventor 陈挺刘文龙周磊徐晨
Owner 中控全世科技(杭州)有限公司
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