A multi-source oblique insertion plasma gas processing device
A gas treatment and plasma technology, applied in gas treatment, separation methods, dispersed particle separation, etc., can solve the problems of weak gas flow rate tolerance, low treatment efficiency, complex structure, etc., to improve tolerance, simple maintenance, Improve the effect of processing
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[0032] Below in conjunction with specific embodiment, further illustrate the present invention. It should be understood that these examples are only used to illustrate the present invention, not to limit the protection scope of the present invention. Improvements and adjustments made by those skilled in the art according to the present invention in practical applications still belong to the protection scope of the present invention.
[0033] In order to better illustrate the present invention, the present invention will be described in detail below in conjunction with the accompanying drawings.
[0034] Such as figure 1 As shown, a multi-source obliquely inserted plasma gas treatment device of the present invention includes an intake channel 1, a deceleration chamber 2, a gas treatment area 4, an exhaust absorption device 5 and a plasma source 3. The gas treatment The upper end 4 of the zone is sequentially connected with the deceleration chamber 2 and the air intake channel...
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