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Preparation method of ITO tubular target material

A technology of tubular and target materials, which is applied in the direction of manufacturing tools, auxiliary molding equipment, metal material coating technology, etc., and can solve the problems of difficult control of thin film deposition thickness uniformity, poor uniformity of etching target materials, and low target material utilization. , to achieve good market prospects, easy to automate production, reduce labor intensity and labor costs

Active Publication Date: 2017-10-13
KUNMING UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The cuboid, cube and cylinder targets are solid. During the sputtering process, the circular permanent magnet establishes a circular magnetic field on the surface of the target and forms an etching area on the circular surface equidistant between the axes. The disadvantage is that the thickness of the film deposition is uniform. The property is not easy to control, the utilization rate of the target is low, only 20%~30%, and the uniformity of the etching target is poor
The utilization rate of ITO tubular targets can reach more than 80%. However, because ITO tubular storage is prone to problems such as uneven density or low density during the preparation process, few manufacturers at home and abroad can produce qualified ITO tubular targets. , most of which are in the development stage

Method used

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  • Preparation method of ITO tubular target material
  • Preparation method of ITO tubular target material
  • Preparation method of ITO tubular target material

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] The preparation method of the ITO tubular target described in this embodiment specifically includes the following steps:

[0023] (1) Mix nanoscale ITO powder with binder PVA and water. The mass percentage of solid phase in the mixed slurry is 65%, the mass percentage of binder PVA is 1%, and the mass percentage of water is 34%;

[0024] (2) Inject the slurry in step (1) at a rate of 19 mL / min into the mold rotating at a rate of 8000r / min. After the grouting is completed, the mold continues to rotate for 10 minutes, and then the mold is placed in an ultrasonic vibrator to maintain 30s, the ultrasonic power is 1.5kw, and the ITO tubular target blank is obtained by demoulding;

[0025] The mold used in this step is as figure 1 , 2 The mold includes a flexible cover 1, a grouting port 2, a ceramic filter core 3, a ceramic filter cover 4, a cover clip 5, a sealing ring 6, a base 7, a fixed rotating shaft 8, and a protrusion is provided on the fixed rotating shaft 8 The ...

Embodiment 2

[0030] The preparation method of the ITO tubular target described in this embodiment specifically includes the following steps:

[0031] (1) Mix nanoscale ITO powder with binder PVA and water. The mass percentage of solid phase in the mixed slurry is 68%, the mass percentage of binder PVA is 2%, and the mass percentage of water is 30%;

[0032] (2) Inject the slurry in step (1) at a rate of 21mL / min into the mold rotating at a rate of 9000r / min. After the grouting is completed, the mold continues to rotate for 13min, and then the mold is placed in an ultrasonic vibrator for 35s , the ultrasonic power is 1.3kw, and the ITO tubular target green body is obtained by demoulding; the mold used in this step has the same structure as that in Example 1, and the flexible cover 1 is a nitrile rubber cover;

[0033] (3) Put the ITO tubular target green body obtained in step (2) into the degreasing furnace for degreasing treatment. The degreasing treatment process is: increase the tempera...

Embodiment 3

[0036] The preparation method of the ITO tubular target described in this embodiment specifically includes the following steps:

[0037] (1) Mix nanoscale ITO powder with binder PVA and water. The mass percentage of solid phase in the mixed slurry is 70%, the mass percentage of binder PVA is 2%, and the mass percentage of water is 28%;

[0038](2) Inject the slurry in step (1) at a rate of 23mL / min into the mold rotating at a rate of 10000r / min. After the grouting is completed, the mold continues to rotate for 15min, and then the mold is placed in an ultrasonic vibrator for 50s , the ultrasonic power is 1kw, and the ITO tubular target green body is obtained by demoulding; the mold used in this step is the same as that in Example 1, except that a grouting port 2 is provided;

[0039] (3) Put the ITO tubular target blank obtained in step (2) into a degreasing furnace for degreasing treatment. The degreasing treatment process is: raise the temperature to 620 °C at a heating rate...

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Abstract

The invention discloses a preparation method of an ITO tubular target material. The preparation method comprises: using ITO nanometer powder as a raw material, dewatering and molding a prepared ITO slurry by using a rotation mold and an ultrasonic wave vibration device to obtain an ITO target material billet, carrying out degreasing treatment on the billet at a low temperature, and sintering the degreased billet under a certain sintering condition to obtain the ITO tubular target material. According to the present invention, with the preparation method, the automated production is easily performed so as to reduce the labor intensity and the labor cost; and the prepared ITO rotating target material product has characteristics of uniform and stable structure, high density and good market prospect, and can meet the application requirements of downstream enterprises.

Description

technical field [0001] The invention relates to a method for preparing an ITO tubular target material, which belongs to the technical field of high transparent conductive material target material preparation. Background technique [0002] ITO targets are key materials for the production of various flat panel displays. At present, ITO transparent conductive films have been widely used in the field of optoelectronics due to their excellent optical and electrical properties, especially in the rapidly developing flat panel display industry. It can be said that the performance and quality of the ITO target almost determines the product quality, production efficiency and yield of the ITO transparent conductive film. At present, planar ITO targets are widely used in the industry for coating, and the shapes of planar ITO targets include cuboids, cubes, cylinders and irregular shapes. The cuboid, cube and cylinder targets are solid. During the sputtering process, the circular perman...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C04B35/457C04B35/622C23C14/08C23C14/35B28B1/02B28B1/26B28B11/24B28B13/02B28B13/06B28B17/00
CPCC23C14/086C23C14/3414C23C14/35C04B35/457C04B35/622B28B1/02B28B1/262B28B11/243B28B13/02B28B13/06B28B17/00C04B2235/3293C04B2235/6562C04B2235/6567C04B2235/96C04B2235/94
Inventor 周晓龙曹函星王志勇曹建春
Owner KUNMING UNIV OF SCI & TECH
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