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Extremely ultraviolet high-order diffraction suppression grating

A diffraction grating and extreme ultraviolet technology, applied in the field of extreme ultraviolet optics, can solve the problems of inaccurate analysis results, errors, and reduced spectral accuracy, and achieve the effects of eliminating harmonic pollution, reducing the influence of noise, and suppressing background noise.

Inactive Publication Date: 2017-08-15
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] In view of this, the present invention provides an extreme ultraviolet advanced suppression diffraction grating to solve the problems in the prior art that the advanced diffraction and first-order diffraction overlap, which brings errors, leads to inaccurate analysis results, and reduces the accuracy of spectroscopy

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  • Extremely ultraviolet high-order diffraction suppression grating
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  • Extremely ultraviolet high-order diffraction suppression grating

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Embodiment Construction

[0026] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0027] In order to suppress the spectral overlap caused by advanced diffraction, the concept of binary sinusoidal grating was proposed in the prior art, and Tonghua numerical simulation and experimental characterization confirmed its ability to suppress advanced diffraction, and then designed a quantum lattice grating , randomly drill holes on the opaque plate, and control the drilling density per unit area to meet the sinusoidal change in one-dimensional space...

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Abstract

The invention discloses an extremely ultraviolet high-order diffraction suppression grating. According to the extremely ultraviolet high-order diffraction suppression grating, a plurality of polygonal transparent through holes having the same shape and area are formed in a light-proof thin film, the polygonal transparent through holes are randomly distributed in a quasitriangular array in the light-proof thin film, thus the extremely ultraviolet high-order diffraction suppression grating can effectively suppress high-order diffraction, including 2n, 3n, 4n and 5n-order diffraction (n is a non-zero integer), at various bands of visible light, extremely ultraviolet light and infrared light, eliminates harmonic pollution, completely suppresses background noise, reduces the influence of noisy points to the greatest extent, improves the resolution and sensitivity, simplifies the process difficulty, and provides technical guarantee and process support for effective suppression of the extreme ultraviolet band.

Description

[0001] This application claims the priority of the domestic application submitted to the China Patent Office on March 15, 2017, with the application number 201710154237.9 and the title of the invention "An Extreme Ultraviolet Advanced Suppression Diffraction Grating", the entire content of which is incorporated by reference in this application . technical field [0002] The invention relates to the technical field of extreme ultraviolet optics, in particular to an extreme ultraviolet advanced suppression diffraction grating. Background technique [0003] Diffraction gratings currently used in spectrometers are generally traditional metal thin film black and white gratings composed of a series of parallel grooves and lines, which are used to measure X-ray spectra. According to the definition of the grating equation d(sinα+sinβ)=nλ, it can be seen that there is not a one-to-one correspondence between the diffraction spectrum and the wavelength, and the problem of multi-level d...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/18
CPCG02B5/1838
Inventor 刘子维浦探超史丽娜谢常青李海亮牛洁斌王冠亚刘明
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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