Deep ultraviolet LED epitaxial structure and fabrication method thereof
An epitaxial structure and deep ultraviolet technology, which is applied in the field of ultraviolet LEDs, can solve the difficulties in the production of high-quality P-type AlGaN, restrict the development of AlGaN deep ultraviolet LEDs, etc., achieve high luminous efficiency and ensure the effect of crystal quality
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[0021] The present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments to facilitate a clear understanding of the present invention, but they do not limit the present invention.
[0022] Such as figure 1 As shown, the epitaxial structure of the present invention is sequentially grown on the substrate material based on MOCVD, specifically:
[0023] The nucleation layer 2 is grown on a transparent substrate with a growth temperature of 950° C. and a growth pressure of 50 mbar; the nucleation layer 2 is made of GaN, AlN or AlGaN with a thickness of 10 nm-50 nm, and the thickness of this embodiment is 15 nm.
[0024] The substrate can be sapphire, AlN, GaN, etc.
[0025]The buffer layer 3 is grown on the nucleation layer, the growth temperature is 1200°C, and the growth pressure is 100mbar; the buffer layer 3 is unintentionally doped u-type AlGaN, the Al composition is 0.2-0.6, and the thickness is 1um-5um. T...
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