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Recovery device of hexachlorodisilane

A technology of hexachlorodisilane and recovery device, applied in the directions of halosilanes, silicon compounds, halogenated silicon compounds, etc., can solve the problems of waste of resources, hexachlorodisilane cannot be recovered, etc., and achieve the effect of effective recovery

Inactive Publication Date: 2017-07-14
CHINA SILICON CORP LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The main purpose of the present invention is to provide a recovery device for hexachlorodisilane to solve the problem in the prior art that the hexachlorodisilane in the polysilicon residue cannot be recovered resulting in waste of resources

Method used

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  • Recovery device of hexachlorodisilane
  • Recovery device of hexachlorodisilane
  • Recovery device of hexachlorodisilane

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0039] The content of hexachlorodisilane in the polysilicon raffinate is 30%, and the treatment capacity is 3m 3 / h; filter the polysilicon residue with a basket filter with a filtration precision of 0.8 μm to obtain a colorless and transparent filtrate.

[0040] Heat the filtrate to 100°C, then pass it into the first rectification tower, control the pressure at the top of the tower to 70KPa, the temperature at the top of the tower is 100°C, the operating pressure difference is 30Kpa, the temperature at the bottom of the tower is 160°C, and the top of the tower is carried out with circulating water. Cooling, the tower kettle is heated by heat transfer oil, and the first overhead rectified liquid is obtained at the top of the tower.

[0041] Pass the distillate at the top of the first tower into the second rectification tower, control the pressure at the top of the tower to 70KPa, the temperature at the top of the tower to 100°C, the operating pressure difference to 30Kpa, and ...

Embodiment 2

[0046] The difference with embodiment 1 is that the rectification liquid in the third tower still is passed into the fourth rectification tower with a tower diameter of 0.4m. The pressure is 100KPa, the temperature at the top of the tower is 190°C, and the operating pressure difference is 50Kpa, so that the reflux ratio is 50. The top of the tower is cooled with circulating water, and the bottom of the tower is heated with heat transfer oil to obtain the fourth top distillate.

Embodiment 3

[0048] The difference with embodiment 1 is that the rectification liquid in the third tower still is passed into the tower diameter and is the fourth rectification tower of 1m, and the fourth rectification tower is a packed tower, and the packing wherein is a bulk packing, and the pressure at the top of the tower is controlled 30KPa, tower top temperature 150°C, operating differential pressure 10Kpa, so that the reflux ratio is 10, wherein, the tower top is cooled by circulating water, and the tower kettle is heated by heat conduction oil to obtain the fourth tower top distillate.

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Abstract

The invention provides a recovery device of hexachlorodisilane. The recovery device of hexachlorodisilane comprises: a filtering unit having a polysilicon raffinate inlet and a filtrate outlet; a first rectifying unit connected with the filtrate outlet of the filtering unit to rectify a filtrate obtained by the filtering unit and having a first tower top rectification liquid outlet; a second rectifying unit connected with the tower top rectification liquid outlet of the first rectifying unit to rectify the tower top rectification liquid of the first rectifying unit and having a second tower bottom rectification liquid outlet; and a third rectifying unit connected with the tower bottom rectification liquid outlet of the second rectifying unit to rectify the second tower bottom rectification liquid of the second rectifying unit. A polysilicon raffinate is filtered to remove solid particles and metal polymer impurities; and the filtrate obtained after the filtration undergoes first-stage rectification, second-stage rectification and third-stage distillation to obtain silicon tetrachloride, hexachlorodisiloxane and a hexachlorodisilane-based third tower bottom rectification liquid at the tower top.

Description

technical field [0001] The invention relates to the field of photovoltaic materials, in particular to a recovery device for hexachlorodisilane. Background technique [0002] Hexachlorodisilane (Si 2 Cl 6 ) is a high-efficiency deoxidizer, which is used as an excellent raw material for amorphous silicon film, photochemical fiber raw material and siloxane, etc. It has broad application prospects and practical value in the fields of semiconductors and optoelectronic materials. Compared with the traditional dichlorodihydrogen silicon and silane gas deposition method to produce silicon nitrogen film, the vapor deposition method of hexachlorodisilane has low deposition temperature, low deposition pressure and high efficiency, and the density, insulation and corrosion resistance of the film can be obtained. Performance and compatibility are better. [0003] Hexachlorodisilane widely exists in the by-products of the polysilicon system, and its content is as high as 10-40%, which ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/107
CPCC01B33/10778C01B33/10784
Inventor 郭树虎赵雄万烨严大洲刘见华李云昊杨典
Owner CHINA SILICON CORP LTD
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