Groove type SOI LIGBT comprising carrier storage layer
A carrier storage and trench gate technology, applied in electrical components, circuits, semiconductor devices, etc., can solve the problems of sweeping out the drift region, large turn-off loss, long turn-off time, etc., to reduce the on-voltage drop, High withstand voltage, the effect of maintaining withstand voltage
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[0019] Such as figure 1 As shown, it is a three-dimensional structural schematic diagram of the device of the present invention, combined with figure 2 , image 3 and Figure 4 It can be obtained that, compared with the traditional device structure, the device of the present invention has a high-concentration carrier storage layer and a dielectric groove.
[0020] The working principle of the present invention is: when the forward conduction is conducted, the PN junction of the anode is opened, and holes are injected into the drift region, and the holes pass through the drift region to reach the carrier storage layer, and are blocked by the carrier storage layer. According to the characteristic principle, more electrons are injected into the drift region, and the conductance modulation effect is enhanced, thereby reducing the forward conduction voltage drop of the device. At the same time, a dielectric groove is introduced to physically prevent holes from being collected b...
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