Texturization method of monocrystalline silicon wafer

A single-crystal silicon wafer, texturing technology, applied in chemical instruments and methods, crystal growth, final product manufacturing, etc., can solve problems such as wide distribution, and achieve the effects of small size, cost reduction, and narrow distribution

Inactive Publication Date: 2017-06-13
DEQING LIJING ENERGY TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The size of the pyramids prepared by the conventional process is about 6-10 μm, and the distribution is wide

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0016] The process steps are as follows:

[0017] 1. Configure texturizing additives: mix 0.05g sodium perfluorooctane sulfonate, 1g polyvinylpyrrolidone, 0.5g acrylic acid-maleic anhydride copolymer, 5g propylene glycol methyl ether, 0.1g sodium benzoate and 0.25g p-toluenesulfonic acid Sodium was sequentially dissolved into 100 ml of deionized water.

[0018] 2. Prepare lye: dissolve 10 g of sodium hydroxide in 990 g of deionized water to obtain a 1% sodium hydroxide aqueous solution.

[0019] 3. Prepare alkaline texturing solution: mix the texturizing additive obtained in step 1 and the lye obtained in step 2 evenly at a mass ratio of 0.5:100.

[0020] 4. Texturing process: immerse the monocrystalline silicon wafer for solar cells into the alkaline texturing solution prepared in step 3 for surface texturing, the texturing temperature is 85°C, and the texturing time is 900s.

[0021] The size of the formed pyramids is small, about 0.8-2 μm, and the distribution is narrow. ...

Embodiment 2

[0023] The process steps are as follows:

[0024] 1. Configure the additive for texturing: Dissolve 0.1g sodium perfluorooctanoate, 5g polyvinylpyrrolidone, 1g acrylic acid-maleic anhydride copolymer, 3g propylene glycol methyl ether, 0.2g sodium benzoate and 0.5g sodium p-toluenesulfonate to 100ml in turn ionized water.

[0025] 2. Prepare lye: dissolve 15g of potassium hydroxide in 985g of deionized water to obtain a 1.5% potassium hydroxide aqueous solution.

[0026] 3. Prepare alkaline texturing solution: mix the texturizing additive obtained in step 1 and the lye obtained in step 2 evenly at a mass ratio of 1:100.

[0027] 4. Texturing process: immerse the monocrystalline silicon wafer for solar cells into the alkaline texturing solution prepared in step 3 for surface texturing, the texturing temperature is 80°C, and the texturing time is 1200s.

Embodiment 3

[0029] The process steps are as follows:

[0030] 1. Configure texturing additives: 0.2g sodium perfluorononenyloxybenzenesulfonate, 0.3g perfluorooctylsulfonyldiethanolamine, 1g polyvinylpyrrolidone, 0.1g acrylic acid-maleic anhydride copolymer, 2g propylene glycol Methyl ether, 0.2 g of sodium benzoate and 2 g of sodium p-toluenesulfonate were successively dissolved in 100 ml of deionized water.

[0031] 2. Prepare lye: dissolve 20 g of sodium hydroxide in 980 g of deionized water to obtain a 2% sodium hydroxide aqueous solution.

[0032] 3. Prepare alkaline texturing solution: mix the texturizing additive obtained in step 1 and the lye obtained in step 2 evenly at a mass ratio of 0.1:100.

[0033] 4. Texturing process: immerse the monocrystalline silicon wafer for solar cells into the alkaline texturing solution prepared in step 3 for surface texturing, the texturing temperature is 88°C, and the texturing time is 600s.

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Abstract

The invention belongs to the technical field of monocrystalline silicon wafer tools, and particularly relates to a texturization method of a monocrystalline silicon wafer. The method comprises the following steps: 1) preparing atexturizationadditive; 2) preparing atexturization solution; and 3) putting the monocrystalline silicon wafer into thetexturization solution prepared in the step 2), and carrying out texturization at 80-88 DEG C for 600-1200 seconds. The method has excellent texturization effect; and the pyramids on thetexturizedsurface have smaller size and narrower distribution, and can reduce the light reflection, thereby enhancing the photoelectric conversion efficiency of the assembled solar cell.

Description

technical field [0001] The invention belongs to the technical field of monocrystalline silicon wafer tools, in particular to a texturing method for monocrystalline silicon wafers. Background technique [0002] In the preparation process of solar cells, reducing the reflection of light by silicon wafers as much as possible and increasing the absorption of light by silicon wafers will effectively improve the conversion efficiency of solar cells. Among them, texturing the surface of silicon wafers is a common way to increase the light absorption of crystalline silicon. In industrial production, a large amount of isopropanol or ethanol is often added to the alkaline texturing solution to improve the texturing effect. For example, Chinese invention patents CN201010195103.X and CN201010195095.9 respectively report two monocrystalline silicon wafer texturing additives and their usage methods. However, it should be pointed out that isopropanol and ethanol belong to low-boiling poi...

Claims

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Application Information

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IPC IPC(8): C30B33/10H01L31/18
CPCC30B33/10H01L31/18Y02P70/50
Inventor 姜翰钦
Owner DEQING LIJING ENERGY TECH CO LTD
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