Carbide ultrahard material for grinding sapphire wafer
A technology of sapphire wafer and superhard material, applied in the field of carbide superhard material, can solve the problems of difficult surface cleaning of sapphire wafer, complicated production process, low utilization rate of equipment, etc., and achieves reduction of the cost of consumables, simple preparation method and low cost Effect
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[0025] The present invention will be described in more detail below through specific examples.
[0026] The carbide superhard material used for grinding sapphire wafers according to the present invention is formed by pressing and sintering high-purity 6H-SiC powder materials, boric acid and graphite according to the following weight percentage distribution in situ, and the specific steps are as follows :
[0027] The first step, raw material ratio
[0028] According to the in-situ synthesis of high-purity 6H-SiC powder material: boric acid: graphite = 57.8% : 35% : 7.2% by weight, accurately weigh the in-situ synthesis of high-purity 6H-SiC powder material, boric acid and graphite, in order to ensure the finished product The quality of carbide superhard materials, in-situ synthesis of high-purity 6H-SiC powder materials requires silicon carbide content ≥ 99.6%, 6H structural purity ≥ 90%, microhardness ≥ 3250kg / mm 2 , toughness value ≥ 72%, particle size ≤ 5 microns; weight ...
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