Reverse conducting-insulated gate bipolar transistor and fabrication method
A technology of edge region and well region, applied in the direction of transistor, semiconductor/solid-state device manufacturing, semiconductor device, etc., can solve the problem of slow switching speed and so on
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[0033] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0034] Such as figure 1 In the shown RC-IGBT, the diode structure formed by the well region 13 and the N+ region of the collector region 16 opposite to the back, that is, FRD, can conduct reverse current (current from the emitter 15 to the collector 17). When the FRD is turned on, the well region 12 of P- injects holes into the drift region 11 . When the IGBT is turned on, the P+ region of the collector region 16 injects holes into the drift region 11 . FRD ...
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