A kind of texturing pretreatment method and texturing method of diamond wire cut polycrystalline silicon wafer
A diamond wire cutting, polycrystalline silicon wafer technology, applied in the direction of post-processing, post-processing details, polycrystalline material growth, etc., can solve the problems of inability to meet market demand, lower conversion efficiency, etc., to reduce reflectivity and increase conversion efficiency. Effect
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Embodiment 1
[0022] A pretreatment method for diamond-wire-cut polysilicon solar cells, using diamond-wire-cut P-type 156 polysilicon wafers as materials, and equally divided into two groups, A and A, wherein group A is according to the traditional texturing method, and group A is according to the method of the present invention deal with. After being processed separately, the refractive index is tested, and then made into a solar cell to measure the electrical parameters.
[0023] The treatment method of group A is as follows:
[0024] (1) The concentrations of hydrofluoric acid, hydrochloric acid, and nitric acid are 20vol%, 30vol%, and 20vol%, respectively, mixed according to the solution volume ratio of 2:1:1, and the polysilicon wafer is put into the solution for treatment. The treatment temperature is 0°C, and the treatment time is 300 seconds, then wash with DI water for 120 seconds, dry after cleaning;
[0025] (2) putting the polysilicon wafer obtained in step (1) into a continu...
Embodiment 2
[0032] A pretreatment method for diamond-wire-cut polysilicon solar cells, using diamond-wire-cut P-type 156 polysilicon wafers as materials, and equally divided into two groups, b and B, wherein group b is according to the traditional texturing method, and group B is according to the method of the present invention deal with. After being processed separately, the refractive index is tested, and then made into a solar cell to measure the electrical parameters. The treatment method of group B is as follows:
[0033] (1) The concentrations of hydrofluoric acid, hydrochloric acid, and nitric acid are 20vol%, 30vol%, and 20vol%, respectively, mixed according to the solution volume ratio of 2:1:1, and the polysilicon wafer is put into the solution for treatment. The treatment temperature is 30°C, and the treatment time is 300 seconds, then wash with DI water for 120 seconds, dry after cleaning;
[0034] (2) putting the polysilicon wafer obtained in step (1) into a continuous resi...
Embodiment 3
[0041] A pretreatment method for polycrystalline silicon solar cells cut by diamond wires, using diamond wire cut P-type 156 polysilicon wafers as materials, and divided into two groups of d and D on average, wherein group d is according to the traditional method of texturing, and group D is according to the method of the present invention deal with. After being processed separately, the refractive index is tested, and then made into a solar cell to measure the electrical parameters.
[0042] The treatment method of group D is as follows:
[0043] (1) The concentrations of hydrofluoric acid, hydrochloric acid, and nitric acid are 20vol%, 30vol%, and 20vol%, respectively, mixed according to the solution volume ratio of 2:1:1, and the polysilicon wafer is put into the solution for treatment. The treatment temperature is 30°C, and the treatment time is 300 seconds, then wash with DI water for 120 seconds, dry after cleaning;
[0044] (2) putting the polysilicon wafer obtained i...
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