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X-ray sensor and manufacturing method thereof

A manufacturing method and sensor technology, which are applied in semiconductor devices, final product manufacturing, sustainable manufacturing/processing, etc., can solve problems such as damage to the sensing unit, and achieve blocking damage, reducing optical interference, and high penetration. and the effect of high refractive index

Inactive Publication Date: 2017-01-04
AU OPTRONICS KUNSHAN CO LTD +1
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In order to solve the above-mentioned problem that the sensing unit is damaged by direct irradiation of X-rays on the sensing unit, the present invention provides an X-ray sensor

Method used

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Embodiment Construction

[0034] Please refer to figure 2 , figure 2 It is a schematic diagram of the X-ray sensor of the present invention. The X-ray sensor 200 includes a sensing substrate 210 and a lead glass substrate 220 . A plurality of sensing units 211 are disposed on the sensing substrate 210 .

[0035] The lead glass substrate 220 has a first surface 2201 and a second surface 2202 opposite to each other. The first surface 2201 is fixed on the sensing substrate 210. For example, in this embodiment, the X-ray sensor 200 further includes an adhesive layer 230, and the first surface 2201 can be fixed on the sensing substrate 210 through the adhesive layer 230. Of course , in other implementation manners, other fixing methods can also be used, as long as the first surface 2201 can be fixed on the sensing substrate 210 . The second surface 2202 of the lead glass substrate 220 has a plurality of grooves 221 corresponding to the plurality of sensing units 211 one-to-one.

[0036] The lead glas...

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Abstract

The invention relates to an X-ray sensor and a manufacturing method thereof. The X-ray sensor comprises a sensing substrate and a lead glass substrate, wherein the sensing substrate is provided with a plurality of sensing units; the lead glass substrate comprises a first surface and a second surface which are opposite; the first surface is fixed on the sensing substrate and a plurality of grooves which correspond to the plurality of sensing units one by one are formed in the second surface; the lead glass substrate also comprises a first reflecting layer, scintillator fluorescent powder and a second reflecting layer; the first reflecting layer is arranged on the side walls of the plurality of grooves; the plurality of grooves are filled with the scintillator fluorescent powder; and the second reflecting layer is arranged on the second surface. According to the X-ray sensor provided by the invention, the damage of an X ray to the plurality of sensing units can be effectively blocked through a method of adding lead glass between the scintillator fluorescent powder and the plurality of sensing units; and furthermore, the lead glass has relatively high penetration rate and a high refractive index, so that optical interference caused by light scattering can also be effectively reduced.

Description

technical field [0001] The invention relates to an X-ray sensor and a manufacturing method thereof, in particular to a low-damage X-ray sensor and a manufacturing method thereof. Background technique [0002] X-ray images are an important tool in medical diagnosis. Digital X-ray imaging is increasingly replacing traditional photographic X-ray film. Digital X-ray imaging has two important reference indicators, which are sensitivity and resolution that affect image quality. The thicker the scintillator is, the better it is to increase the sensitivity; however, the visible light emitted by the scintillator will cause optical interference, and the resolution of the image will decrease. [0003] In order to solve the above problems, the industry has made the scintillator into a microstructure to improve the sensitivity and resolution of the image quality, please refer to figure 1 . The X-ray sensor 100 includes a sensing substrate 110, a plurality of sensing units 120, an adh...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/115H01L31/0216H01L31/0203H01L31/18
CPCH01L31/0203H01L31/0216H01L31/02161H01L31/115H01L31/18Y02P70/50
Inventor 陈德铭赖颖辉黄胜国王腾岳李仁智
Owner AU OPTRONICS KUNSHAN CO LTD
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