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Ion source device of plasma ionization

A technology of plasma ionization and ion source, applied in the direction of ion source/gun, circuit, discharge tube, etc., can solve the problems of poor plasma focusing effect and short annihilation distance, achieve long annihilation distance, reduce gas leakage, and reduce gas space Effect

Active Publication Date: 2016-09-28
SHENZHEN GRADUATE SCHOOL TSINGHUA UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The main purpose of the present invention is to overcome the deficiencies of the prior art, provide a plasma ionization ion source device, and solve the problems of poor plasma focusing effect and short annihilation distance caused by dielectric barrier

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  • Ion source device of plasma ionization
  • Ion source device of plasma ionization

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Embodiment Construction

[0028] Embodiments of the present invention will be described in detail below. It should be emphasized that the following description is only exemplary and not intended to limit the scope of the invention and its application.

[0029] refer to figure 1 and figure 2 , in a specific embodiment, a plasma generating device, including a reaction gas metal transmission pipe 1, a polyether ether ketone connecting pipe 2, a coaxial support 3, an inner tungsten wire electrode 4, a quartz insulating medium chamber 5, and a coaxial support 6 , an outer copper foil electrode 7 , a polyether ether ketone capillary 8 , and a quartz capillary 9 . One end of the reaction gas metal transmission pipe 1 is a gas inlet, and the other end is embedded in the polyetheretherketone connecting pipe 2 and connected to the coaxial bracket 3; the polyetheretherketone 2 connecting pipe passes through the polyether ether ketone The stretchability of the reaction gas metal transmission pipe 1 and the qua...

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Abstract

The invention relates to an ion source device of plasma ionization. The ion source device comprises reaction gas metal transmission pipe, a connecting pipe, an insulating medium cavity, an internal electrode, an external electrode, an external capillary tube and an internal capillary tube, one end of the reaction gas metal transmission pipe is a gas inlet, the other end of the reaction gas metal transmission pipe is embedded into one end of the connecting pipe in a sealed manner, the other end of the connecting pipe is in sealed connection with one end of the insulating medium cavity, the internal electrode is arranged in the connecting pipe coaxially, the insulating medium cavity is a plasma generation cavity, a plasma stream is formed in the outlet of the cavity, the external electrode is pasted to the external surface of the outlet of the installing medium cavity, the direction of an electric field generated by the internal electrode is basically consistent with that of an electric field generated by the external electrode, the direction the direction of a gas flow field generated by the internal electrode is basically consistent with that of a gas flow field generated by the external electrode, the external capillary tube is in sealing connection with the outlet of the insulating medium cavity, the internal capillary tube is embedded in the external capillary tube in an embedded manner, and a focused plasma beam is formed. The ion source device can generate a plasma beam ionization sample of long annihilation distance and good focusing effect.

Description

technical field [0001] The invention relates to a plasma ionization ion source device. Background technique [0002] Mass spectrometry imaging is an instrument for detecting the spatial distribution of material components, which can realize the detection of spatial distribution of solid sample components, antique identification, criminal investigation, judicial identification and other fields. The use of mass spectrometry imaging to detect the spatial distribution of sample components must first convert the solid sample into an ion form, and different ionization methods are generally used for samples of different forms. [0003] For plasma ionization of solid samples through dielectric barriers, two coaxial and axially overlapping electrode structures are often used. The plasma produced by dielectric barrier discharge has problems such as poor focusing effect and short annihilation distance. Contents of the invention [0004] The main purpose of the present invention is ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01J49/10H01J49/26H01J37/32
CPCH01J37/32009H01J49/10H01J49/26
Inventor 王晓浩林森森钱翔余泉倪凯
Owner SHENZHEN GRADUATE SCHOOL TSINGHUA UNIV
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