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vacuum pump

一种真空泵、转子室的技术，应用在泵、泵元件、旋转活塞式泵等方向，能够解决妨碍干式真空泵的工艺气体吸入等问题

Active Publication Date: 2020-04-21
EBARA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, trying to install a large trap, etc. at the suction port of the dry vacuum pump or to install traps in multiple stages has caused the increase in the size and cost of the manufacturing process equipment.
In addition, if the condensate accumulates on the trap and causes clogging, it will hinder the suction of the process gas by the dry vacuum pump, so frequent cleaning or replacement of the trap and other maintenance may be required.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0068] figure 1 It is a schematic configuration diagram showing the vacuum pump device of the present embodiment. figure 2 It is a schematic configuration diagram showing the vacuum pump device of this embodiment from another cross section. The vacuum pump device of the present embodiment is connected to a vacuum chamber (not shown) for performing CVD (Chemical Vapor Deposition), for example, and exhausts gas from the vacuum chamber. The vacuum pump device of the present embodiment can be suitably applied to a vacuum chamber in which the gas in the vacuum chamber contains solid foreign matter, especially when the solid foreign matter is a non-sublimable solid, but is not limited thereto. In addition, the vacuum pump device of this embodiment can be suitably applied to a vacuum chamber that generates light gas such as hydrogen, but is not limited thereto.

[0069] figure 1 A cross section including an axis line AR1 of one pump rotor 310 among a pair of pump rotors 310 and 4...

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Abstract

There is provided a vacuum pump capable of preventing foreign materials from flowing into a gap between rotors or the like and obtaining low ultimate pressure. The vacuum pump includes two rotating shafts formed extending in a first axial direction, a rotor casing, rotors, and a shielding portion. The rotor casing includes a rotor chamber disposed along the two rotating shafts, a suction port communicating with the rotor chamber, and an exhaust port communicating with the rotor chamber. The rotors are mounted on the two rotating shafts and disposed in the rotor chamber. The shielding portion is configured to prevent a gas sucked from the suction port into the rotor chamber from directly flowing into a gap between the rotors and is disposed between the suction port and inside the rotor chamber.

Description

technical field [0001] The present invention relates to vacuum pumps. Background technique [0002] In the manufacturing process of semiconductor devices and liquid crystal devices, a dry vacuum pump is connected to the vacuum chamber, and the process gas introduced into the vacuum chamber is exhausted by the vacuum pump. In the process gas exhausted by the vacuum pump, substances that solidify due to reactions in the vacuum chamber or substances that are easily solidified may be mixed as foreign substances. [0003] In the dry vacuum pump, the gap (gap) between the rotor and the rotor or between the rotor and the casing is set to be small. Therefore, if the coagulated matter penetrates into the pump, it may accumulate or bite into these gaps inside the pump, thereby hindering the rotation of the rotor. For this reason, a trap or a filter for suppressing intrusion of condensate into the pump may be provided at the suction port of the dry vacuum pump. [0004] prior art li...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): F04B37/16
CPCF04B37/16F04C18/123F04C18/126F04C23/001F04C25/02F04C29/0092F04C2280/02
Inventor 盐川笃志
Owner EBARA CORP
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