Gene expression programming (GEP) bidirectional prediction-based short elliptic arc fitting method

A two-way prediction, elliptical arc technology, applied in the field of digital measurement, can solve the problem of elliptical arc parameter fitting error climbing

Inactive Publication Date: 2016-09-07
ZHENGZHOU UNIVERSITY OF LIGHT INDUSTRY
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The study found that when the length of the ellipse arc is less than 1 / 4 of the entire ellipse, with the further reduction of the length of the ellipse arc, the parameters of the ellipse arc (center coordinates, semi-major axis, semi-minor axis, and inclination angle) obtained by the above method The fitting error will rise sharply and greatly

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  • Gene expression programming (GEP) bidirectional prediction-based short elliptic arc fitting method
  • Gene expression programming (GEP) bidirectional prediction-based short elliptic arc fitting method
  • Gene expression programming (GEP) bidirectional prediction-based short elliptic arc fitting method

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[0035] Such as Figure 1-Figure 4 As shown, the present invention intends to clarify a new idea and new method for improving the fitting accuracy of short elliptical arcs, mainly covering three aspects. One is to use the wavelet filter method to denoise the original short elliptic arc observation data. The second is to use the GEP algorithm to predict the two-way finite length of the observation data after the denoising of the short elliptical arc, which is essentially equivalent to extending the length of the short elliptical arc and reducing the fitting error of the parameters of the short elliptical arc; the third is to use weighted The least squares fitting algorithm fits the predicted short ellipse arc observation data. The weighted least squares fitting algorithm can effectively improve the accuracy of those outlier observation data by defining the weight coefficients of different observation data samples in the objective function. anti-interference ability. Concrete i...

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Abstract

The invention discloses a gene expression programming (GEP) bidirectional prediction-based short elliptic arc fitting method, belongs to the technical field of digital measurement, and relates to related knowledge in aspects of GEP prediction modeling and least square fit. The method comprises the step of firstly performing denoising processing on original observation data of a short elliptic arc by adopting a wavelet filtering method, and secondly performing bidirectional finite length prediction on the denoised observation data of the short elliptic arc by utilizing a constructed GEP prediction model, equivalently, extending the length of the short elliptic arc in essence. The invention proposes an adaptive definition method for a mutation rate of a GEP algorithm, which can effectively inhibit the occurrence of an algorithm prematurity phenomenon and increase the algorithm convergence speed. Finally, the predicted observation data of the short elliptic arc is fitted by adopting a weighted least square fit algorithm, so that the fitting precision and stability of the short elliptic arc are remarkably improved.

Description

technical field [0001] The invention "a short ellipse arc fitting method based on Gene Expression Programming (GEP) bidirectional prediction" belongs to the field of digital measurement technology, and involves the theory and knowledge of GEP prediction modeling and least squares fitting. Background technique [0002] As an important member of the geometric primitive family, ellipse fitting algorithms are widely used in mechanical engineering, military equipment, image processing, astronomical surveying, mine surveying, aerospace, medical and health and other fields. However, in many cases, due to the limitation of measurement conditions and working conditions, digital measurement equipment cannot obtain observation points on the entire ellipse circumference, and can only measure a section of ellipse arc. Another one, many measurement objects (such as: mechanical parts) are themselves an elliptical arc. Ellipse arc fitting, especially the fitting algorithm of short ellipse ...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G06F19/00
CPCG16Z99/00
Inventor 费致根苏锦贾玉珍徐小洁袁东锋
Owner ZHENGZHOU UNIVERSITY OF LIGHT INDUSTRY
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