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Mesoporous silicon, preparation method of same, and method of photolyzing water to produce hydrogen

A technology of mesoporous silicon and mesoporous silicon dioxide, applied in the field of mesoporous silicon and its preparation, can solve the problems of reducing the active sites on the surface of the material, poor crystallinity of mesoporous silicon materials, and limiting the transmission of photocharges, and achieves excellent results. The performance, good crystallinity, and enhanced charge separation of photo-splitting water for hydrogen production

Active Publication Date: 2016-08-31
UNIV OF SCI & TECH OF CHINA
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Problems solved by technology

However, this method uses expensive and dangerous potassium-sodium alloys, and the prepared mesoporous silicon material has poor crystallinity, which limits the transmission of photoelectric charges, and the high content of silicon oxide reduces the active sites on the surface of the material.
The hydrogen production rate of water photolysis under visible light is only 337 μmolH 2 h -1 g -1 Si, and poor cycle stability

Method used

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  • Mesoporous silicon, preparation method of same, and method of photolyzing water to produce hydrogen
  • Mesoporous silicon, preparation method of same, and method of photolyzing water to produce hydrogen
  • Mesoporous silicon, preparation method of same, and method of photolyzing water to produce hydrogen

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preparation example Construction

[0028] The invention provides a method for preparing mesoporous silicon, comprising: S1) mixing colloidal silica and low-temperature eutectic salt in water to obtain a silica reaction solution; S2) subjecting the silica reaction solution to Atomization to obtain atomized droplets; S3) heat-treating the atomized droplets to obtain mesoporous silica; S4) mixing the mesoporous silica with magnesium powder, After being calcined in the atmosphere, it is immersed in an acid solution to obtain mesoporous silicon.

[0029] The present invention uses colloidal silicon dioxide as the silicon source, and the cost is far lower than the silicon wafers required for anodic oxidation and staining and corrosion.

[0030] Mix colloidal silicon dioxide and low-temperature eutectic salt in water to obtain silicon dioxide reaction liquid. Wherein, the low-temperature eutectic salt can be a low-temperature eutectic salt well known to those skilled in the art, and there is no special limitation. In...

Embodiment 1

[0047] 2.054g of sodium nitrate and 1.437g of lithium nitrate were dissolved in 26.55mL of deionized water to prepare a low-temperature eutectic salt solution, and 3.45mL of colloidal silica (Ludox TM-40, a product of Sigma-Aldrich) The suspended aqueous solution is added to the low-temperature eutectic salt solution to form a 1mol / L silica reaction solution. After the reaction solution is ultrasonically dispersed for 5 minutes, it is then transferred to an ultrasonic atomizer. The frequency of the ultrasonic atomizer is 1.7 MHz.

[0048] The outlet of the ultrasonic atomization generator is connected with the inlet of the tube furnace, and the outlet of the tube furnace is connected with the product collection container. Using argon as the carrier gas with an airflow rate of 0.4L / min, the atomized liquid droplets are brought into a tube furnace at 500°C for heating and reaction, and the generated product enters the collector along with the airflow. The solution in the collec...

Embodiment 2

[0052] Prepared according to the preparation method in Example 1, only changing the ratio of the amount of the low-temperature eutectic salt to the amount of silicon dioxide to 1:1, you can get a specific surface area of ​​60m 2 / g of mesoporous silica.

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Abstract

The invention provides mesoporous silicon, a preparation method of same, and a method of photolyzing water to produce hydrogen. The preparation method includes the steps of: 1) mixing colloidal silicon dioxide with low-temperature eutectic salt in water, and atomizing the mixture to prepare atomized small drops; 2) performing thermal-treatment to obtain mesoporous silicon dioxide; and 3) mixing the mesoporous silicon dioxide with magenisum powder, and calcining the mixture in vacuum atmosphere or a protective atmosphere, and soaking the calcined mixture in an acid solution to prepare the mesoporous silicon. The mesoporous silicon has small size, good dispersion property, large specific area, good crystallization performance and less defects. The mesoporous silicon is increased in catalytic area, is increased in visible light absorption rate, is enhanced in charge separation and has good charge transfer property. The mesoporous silicon, within the visible light range, has excellent performance of photolyzing water to produce hydrogen. The method is simple, is low in cost and avoids environment pollution.

Description

technical field [0001] The invention belongs to the technical field of hydrogen production by photolysis of water, and in particular relates to mesoporous silicon and a preparation method thereof, and a method for production of hydrogen by photolysis of water. Background technique [0002] Since silicon is the most abundant element on earth except oxygen, and is also the most commonly used semiconductor material, it has the advantages of wide sources and low cost. The application of silicon in the field of visible light photolysis of water to produce hydrogen will greatly alleviate the human energy and environmental pollution crisis. [0003] One of the existing materials for hydrogen production by photolysis of water is oxide semiconductors such as titanium dioxide, nickel oxide, and zinc oxide. Although these materials have been studied in depth and show good stability in the photocatalytic process, they are The band gap is generally about 3.0eV, and it can only show good...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/023C01B3/04B01J21/08
CPCC01B3/042C01B33/023B01J21/08C01P2004/04C01P2004/03C01P2002/72C01P2006/12B01J35/615Y02E60/36
Inventor 徐航勋宋宏光熊宇杰
Owner UNIV OF SCI & TECH OF CHINA
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