TiN-Ag nano composite coating and preparation and application thereof

A nanocomposite coating and titanium alloy technology, applied in the field of biomedicine, to achieve the effect of Vickers hardness improvement, good hydrophilicity and cell compatibility, and improvement of mechanical properties

Inactive Publication Date: 2016-08-17
TIANJIN NORMAL UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In order to solve the problem of existing titanium alloy materials, the present invention fixes an Ag round target with a diameter of 50.8 mm on the pulsed DC target, and a TiN round target of the same size on the radio frequency target.

Method used

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  • TiN-Ag nano composite coating and preparation and application thereof
  • TiN-Ag nano composite coating and preparation and application thereof
  • TiN-Ag nano composite coating and preparation and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0034] The film samples were obtained by DC magnetron sputtering and radio frequency magnetron sputtering on the JGP-450 magnetron sputtering deposition system. The sputtering targets were high-purity (99.99% ) compound titanium nitride (TiN) target and a high-purity (99.99%) silver (Ag) target with a diameter of 50.9 mm and a thickness of 3 mm. The titanium alloy disc with a diameter of 10 mm is used as the substrate, and the titanium alloy disc substrate is placed into the cavity Before the chamber, ultrasonically clean with acetone for 20 minutes, then ultrasonically clean with alcohol for 5 minutes, and dry it. The background vacuum of the experiment is 4.0×10 -4 Pa, before depositing the film, the substrate was bias cleaned for 15 min, the air pressure during cleaning was 5.0 Pa, and the bias voltage was -600 V. During the deposition of the film, the substrate is continuously rotated to improve the uniformity of the film. The method of co-sputtering is adopted, the TiN ...

Embodiment 2

[0036] The film samples were obtained by DC magnetron sputtering and radio frequency magnetron sputtering on the JGP-450 magnetron sputtering deposition system. The sputtering targets were high-purity (99.99% ) compound titanium nitride (TiN) target and a high-purity (99.99%) silver (Ag) target with a diameter of 50.9 mm and a thickness of 3 mm. The titanium alloy disc with a diameter of 10 mm is used as the substrate, and the titanium alloy disc substrate is placed in the Before the chamber, ultrasonically clean it with acetone for 20 min, then ultrasonically clean it with alcohol for 5 min, and dry it. The background vacuum of the experiment is 4.0×10 -4 Pa, before depositing the film, the substrate was bias cleaned for 15 min, the air pressure during cleaning was 5.0 Pa, and the bias voltage was -600 V. During the deposition of the film, the substrate is continuously rotated to improve the uniformity of the film. The method of co-sputtering is adopted, the TiN target uses...

Embodiment 3

[0038] The film samples were obtained by DC magnetron sputtering and radio frequency magnetron sputtering on the JGP-450 magnetron sputtering deposition system. The sputtering targets were high-purity (99.99% ) compound titanium nitride (TiN) target and a high-purity (99.99%) silver (Ag) target with a diameter of 50.9 mm and a thickness of 3 mm. The titanium alloy disc with a diameter of 10 mm is used as the substrate, and the titanium alloy disc substrate is placed into the cavity Before the chamber, ultrasonically clean with acetone for 20 minutes, then ultrasonically clean with alcohol for 5 minutes, and dry it. The background vacuum of the experiment is 4.0×10 -4 Pa, before depositing the film, the substrate was bias cleaned for 15 min, the air pressure during cleaning was 5.0 Pa, and the bias voltage was -600 V. During the deposition of the film, the substrate is continuously rotated to improve the uniformity of the film. The method of co-sputtering is adopted, the TiN ...

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Abstract

The invention discloses a TiN-Ag nano composite coating and a preparation and application thereof. The TiN-Ag nano composite coating is characterized by being a composite film obtained by magnetron co-sputtering deposition; and a certain substrate temperature is kept in the sputtering process, and the obtained thickness is between 0.5[mu] m and 1[mu] m. The negative bias voltage of a substrate in the preparation process is adjusted by experiments; for an obtained TiN-Ag nano composite coating, the hardness of the substrate is remarkably improved; Ag elements are uniformly distributed in a TiN film, so a contact angle of the TiN film is significantly smaller than that of a TiN film in which no Ag is doped, good hydrophilicity is obtained and cell compatibility is improved; and the TiN-Ag nano composite coating is expected to improve application of a titanium alloy in biomedicine. The material formed by the method disclosed by the invention is stable in structure, the method can be repeated, and preparation conditions are controllable.

Description

[0001] This invention was supported by the National 863 Program Funding Project (2015AA034702). technical field [0002] The invention relates to the preparation of a functional thin film on a titanium alloy applied to dental implants and intervertebral cages, and is applied in the field of biomedicine, and the surface of the titanium alloy is modified and optimized by a method of magnetron co-sputtering. More specifically, it is a TiN-Ag nanocomposite coating and its preparation method and application. Background technique [0003] At present, in the field of biomedical materials, more and more biomaterials are used for artificial organs and devices, but the main problems faced by the materials are the corrosion caused by the physiological environment and the degradation of the properties of the implanted materials, which may cause damage to the human body. side effects, the material may also lose its effectiveness. TiN film has been widely studied and applied because of i...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/06C23C14/16A61L27/30A61L27/50A61L27/54
CPCA61L27/306A61L27/50A61L27/54A61L2300/104A61L2300/404A61L2400/18C23C14/0617C23C14/165C23C14/352
Inventor 李德军许双志董磊顾汉卿万荣欣
Owner TIANJIN NORMAL UNIVERSITY
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