TiN-Ag nano composite coating and preparation and application thereof
A nanocomposite coating and titanium alloy technology, applied in the field of biomedicine, to achieve the effect of Vickers hardness improvement, good hydrophilicity and cell compatibility, and improvement of mechanical properties
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Embodiment 1
[0034] The film samples were obtained by DC magnetron sputtering and radio frequency magnetron sputtering on the JGP-450 magnetron sputtering deposition system. The sputtering targets were high-purity (99.99% ) compound titanium nitride (TiN) target and a high-purity (99.99%) silver (Ag) target with a diameter of 50.9 mm and a thickness of 3 mm. The titanium alloy disc with a diameter of 10 mm is used as the substrate, and the titanium alloy disc substrate is placed into the cavity Before the chamber, ultrasonically clean with acetone for 20 minutes, then ultrasonically clean with alcohol for 5 minutes, and dry it. The background vacuum of the experiment is 4.0×10 -4 Pa, before depositing the film, the substrate was bias cleaned for 15 min, the air pressure during cleaning was 5.0 Pa, and the bias voltage was -600 V. During the deposition of the film, the substrate is continuously rotated to improve the uniformity of the film. The method of co-sputtering is adopted, the TiN ...
Embodiment 2
[0036] The film samples were obtained by DC magnetron sputtering and radio frequency magnetron sputtering on the JGP-450 magnetron sputtering deposition system. The sputtering targets were high-purity (99.99% ) compound titanium nitride (TiN) target and a high-purity (99.99%) silver (Ag) target with a diameter of 50.9 mm and a thickness of 3 mm. The titanium alloy disc with a diameter of 10 mm is used as the substrate, and the titanium alloy disc substrate is placed in the Before the chamber, ultrasonically clean it with acetone for 20 min, then ultrasonically clean it with alcohol for 5 min, and dry it. The background vacuum of the experiment is 4.0×10 -4 Pa, before depositing the film, the substrate was bias cleaned for 15 min, the air pressure during cleaning was 5.0 Pa, and the bias voltage was -600 V. During the deposition of the film, the substrate is continuously rotated to improve the uniformity of the film. The method of co-sputtering is adopted, the TiN target uses...
Embodiment 3
[0038] The film samples were obtained by DC magnetron sputtering and radio frequency magnetron sputtering on the JGP-450 magnetron sputtering deposition system. The sputtering targets were high-purity (99.99% ) compound titanium nitride (TiN) target and a high-purity (99.99%) silver (Ag) target with a diameter of 50.9 mm and a thickness of 3 mm. The titanium alloy disc with a diameter of 10 mm is used as the substrate, and the titanium alloy disc substrate is placed into the cavity Before the chamber, ultrasonically clean with acetone for 20 minutes, then ultrasonically clean with alcohol for 5 minutes, and dry it. The background vacuum of the experiment is 4.0×10 -4 Pa, before depositing the film, the substrate was bias cleaned for 15 min, the air pressure during cleaning was 5.0 Pa, and the bias voltage was -600 V. During the deposition of the film, the substrate is continuously rotated to improve the uniformity of the film. The method of co-sputtering is adopted, the TiN ...
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