Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A method for preparing dlc thick film by high-efficiency magnetic filtration plasma deposition

A plasma and metal plasma technology, used in the field of hard wear-resistant coatings, can solve the problems of difficult to achieve thickness, difficult to prepare thick films, soft hardness, etc., and achieve low friction coefficient, high bonding force, arc flow Size controllable effect

Active Publication Date: 2019-07-26
BEIJING NORMAL UNIVERSITY
View PDF4 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

These technologies are very mature for the preparation of DLC films below 20 microns, but it is difficult to achieve the above-mentioned technologies for the preparation of DLC films with a thickness greater than 30 microns
For example, chemical vapor deposition of DLC is easy to prepare DLC thick film, but the hardness is generally soft
DLC prepared by ordinary physical vapor deposition has high hardness, but it is difficult to prepare thick films

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A method for preparing dlc thick film by high-efficiency magnetic filtration plasma deposition
  • A method for preparing dlc thick film by high-efficiency magnetic filtration plasma deposition
  • A method for preparing dlc thick film by high-efficiency magnetic filtration plasma deposition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0028] In conjunction with the description of the drawings, taking Ti ion source and Ti arc source as examples, the DLC thick film process flow of the present invention for preparing a metal carbide mosaic structure by magnetic filtration plasma deposition is introduced in detail. The implementation steps are as follows:

[0029] 1. Substrate polishing and cleaning:

[0030] (a) Polishing: Use No. 400, No. 1000, and No. 1500 sandpaper to polish the Φ25mm steel sample 101 in sequence, and then use diamond polishing paste and polishing flannelette to polish the smoothed steel sample.

[0031] (b) Cleaning: Use alcohol and acetone to ultrasonically clean the substrate steel sample.

[0032] 2. "Pinning" layer 102 preparation:

[0033] (a) Injection 1: fix the base material steel sample on the sample stage 201, and turn it to the injection target position to start injection. The implanted ion source is a pure Ti ion source with a purity of 99.9%, and the implantation conditions ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Vickers hardnessaaaaaaaaaa
Login to View More

Abstract

The invention discloses a method for preparing Metal carbide-inlaid Diamond-like Carbon (MC / DLC) films with the thicknesses larger than 30 micrometers, belongs to the field of preparation of hard abrasion-resistant coatings, and particularly relates to a technology for preparing MC / DLC thick films by the aid of magnetic filter plasma deposition processes.MC / DLC thick film structures comprise ion injection pinning layers, metal transition layers and the MC / DLC films.The method has the advantages that the DC / DLC films prepared by the aid of ion injection technologies, magnetic filter technologies and cathodic arc deposition technologies are high in binding force, the arc current intensity, the magnetic field intensity of bent pipes and the gas inflow of gas with carbon are controlled in deposition procedures, accordingly, the thicknesses, the hardness, the rub resistance and the abrasion resistance of the MC / DLC thick films can be optimized, and the high-quality MC / DLC thick films can be prepared by the aid of the method; magnetic filter plasma deposition equipment for implementing the method has proprietary intellectual property rights and is easy to operate, processes are mature, the MC / DC films can be produced on a large scale, and the method is suitable for deposition application to high-hardness abrasion-resistant coatings in all industrial components such as bearings of cutters.

Description

technical field [0001] The invention belongs to the field of hard wear-resistant coatings, in particular to a method for preparing an ultra-thick MC / DLC film deposited by high-efficiency magnetic filtration plasma. [0002] technical background [0003] Diamond-like carbon film (Diamond-like carbon, DLC) is an amorphous carbon film, which has a high structure and performance with diamond, but unlike diamond, the covalent bond between C atoms in the DLC structure contains two heterogeneous SP3 hybridization and SP2 hybridization, and a remote disordered three-dimensional network structure formed by mixing SP2 with SP3 as the main body. The film was firstly prepared by the German scholar Aisenberg using carbon ion beam enhanced deposition technology, which is an amorphous carbon film with similar characteristics to diamond, and is defined as DLC. Similar to diamond, DLC not only has very high strength, hardness and friction and wear resistance, but also has excellent chemical ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/48C23C14/16C23C14/06C23C14/22
Inventor 廖斌欧阳晓平罗军张旭吴先映王宇东
Owner BEIJING NORMAL UNIVERSITY
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com