A method for detecting the degree of zn diffusion in the window region of a diffused zn semiconductor laser and its realization device

A diffusion degree, laser technology, applied in the structure of the active area and other directions, can solve the problems of reducing the gain area, narrow window area, high precision requirements, etc., to ensure stability and repeatability, improve long-term reliability, Simple detection method

Active Publication Date: 2018-08-28
Shandong Huaguang Optoelectronics Co. Ltd.
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0007] The above two patents have the following defects: Zn atom is an acceptor impurity for III-V semiconductor materials. When Zn is diffused in the window region of semiconductor lasers, if the diffusion temperature and time are not well grasped, Zn Severe lateral diffusion will reduce the area of ​​the gain region and generate light absorption, which will affect the performance of semiconductor lasers
However, the window area of ​​semiconductor lasers is generally narrow, about 20-30 μm, and the measurement of micro-area PL spectrum requires high precision of light source and instrument
Moreover, the ohmic contact layer GaAs absorbs PL, and the surface GaAs layer needs to be removed during the test, which sometimes affects the contact voltage of the semiconductor laser.

Method used

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  • A method for detecting the degree of zn diffusion in the window region of a diffused zn semiconductor laser and its realization device
  • A method for detecting the degree of zn diffusion in the window region of a diffused zn semiconductor laser and its realization device
  • A method for detecting the degree of zn diffusion in the window region of a diffused zn semiconductor laser and its realization device

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Embodiment 1

[0046] A method for detecting the diffusion degree of Zn in the window region of a diffused Zn semiconductor laser, the diffused Zn semiconductor laser comprising an ohmic contact layer 4, an upper confinement layer 5, an active region 6, a lower confinement layer 7, a substrate 8, and an expanded Zn window region 9. The exposed area near the cavity surface of the diffused Zn semiconductor laser is the expanded Zn window area 9, and the specific steps include:

[0047] A, measure the voltage V corresponding to the current value in the IV curve of the diffused Zn semiconductor laser, and the specific steps include:

[0048] (1) Set the temperature of the test substrate to be 25° C.; the test fixture clamps the diffused Zn semiconductor laser, that is: the forward current port of the test fixture is in contact with the anode of the diffused Zn semiconductor laser, and the reverse current port of the test fixture is in contact with the diffused Zn semiconductor laser. Diffused Zn...

Embodiment 2

[0060] According to a method for detecting the degree of Zn diffusion in the window region of a diffused Zn semiconductor laser described in embodiment 1, the difference is that in embodiment 2, the Zn diffusion temperature is 580° C., and the Zn diffusion time is 20 minutes. Figure 5 The IV curve of the diffused Zn semiconductor laser under this diffusion condition.

[0061] The value of the current value is 0.1mA, and the voltage V corresponding to the current value obtained in the IV curve is 1.47V;

[0062] At this time, Von-0.15≤V

Embodiment 3

[0064] According to a kind of method for detecting the diffusion degree of Zn in the window region of the diffused Zn semiconductor laser described in embodiment 1, the difference is that the Zn diffusion temperature becomes 580° C., and the diffusion time becomes 40 minutes. Figure 6 The IV curve of the diffused Zn semiconductor laser under this diffusion condition.

[0065] The value of the current value is 0.1mA, and the voltage V corresponding to the current value obtained in the IV curve is 1.05V;

[0066] At this time, if V

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Abstract

The invention relates to a method for detecting the Zn diffusion degree of the window area of a semiconductor laser with Zn diffusion, specifically comprising the following steps: (A) measuring a voltage V corresponding to a current value in an IV curve of a semiconductor laser with Zn diffusion; (B) measuring an on voltage Von corresponding to a current value in an I1V1 curve of a semiconductor laser with neither Zn diffusion nor other current bypasses; and (C) judging the Zn diffusion degree based on the voltage V and the on voltage Von: if Von-0.05<=V<=Von, judging that Zn has not entered an active region or has just entered the active region, the mixing degree of the quantum well is insufficient, and the zinc diffusion degree is not enough; if Von-0.15<=V<Von-0.05, judging that the zinc diffusion degree is just right; and if V<Von-0.15, judging that Zn enters a lower limiting layer, the zinc diffusion degree is severe, and the device performance is affected. According to the invention, the zinc diffusion degree is detected effectively, full mixing of the quantum well is ensured, and the long-term reliability of the semiconductor laser is improved; and the phenomenon that excessive zinc impurities enter the lower limiting layer is avoided, and the influence on the current distribution of a gain region is avoided.

Description

technical field [0001] The invention relates to a method for detecting the diffusion degree of Zn in a window region of a diffused Zn semiconductor laser and a device for realizing it, and belongs to the technical field of semiconductor laser detection. Background technique [0002] Due to the advantages of small size, low energy consumption, and easy assembly and integration, high-power semiconductor lasers have attracted widespread attention, and have been applied to optical storage, optical communications, infrared lighting, laser processing, and pumping solid-state lasers. Increasing the output power of semiconductor lasers and improving the long-term reliability of semiconductor lasers have always been the focus of research on high-power semiconductor lasers. In recent years, the continuous output power of single-tube semiconductor lasers can work stably above the watt level, and the peak power of semiconductor laser arrays driven by pulse currents has also reached seve...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01S5/34
Inventor 朱振徐现刚张新苏建
Owner Shandong Huaguang Optoelectronics Co. Ltd.
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