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Light-sensitive nanometer silicon dioxide and method for preparing same

A nano-silica, silica technology, applied in the direction of coating, can solve the problems of inability to achieve bonding, cross-linking and curing, achieve good application prospects, avoid agglomeration, and improve the effect of dispersibility

Inactive Publication Date: 2016-06-15
INST OF CHEM CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] However, there is no photoinitiator unit in the molecular chain of the above-mentioned modified nano-silica, so it cannot be covalently bonded and cross-linked with the polymer matrix under ultraviolet light irradiation to improve its performance. stability in the matrix

Method used

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  • Light-sensitive nanometer silicon dioxide and method for preparing same
  • Light-sensitive nanometer silicon dioxide and method for preparing same
  • Light-sensitive nanometer silicon dioxide and method for preparing same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0053] (1) Preparation of nano-silica dispersion:

[0054] Mix 30ml of ethanol, 1.35ml of ammonia water and 0.6ml of deionized water, raise the temperature to 60°C, then add 1.5ml of tetraethyl orthosilicate to the solution, continue to stir and react at 60°C for 12 hours to obtain carbon dioxide Silicon nanoparticle dispersion.

[0055] (2) Surface modification of silica:

[0056] Adding 4ml of mass concentration to the silica nanoparticle dispersion obtained in step (1) is the toluene solution of Bp of 200mg / ml (the feeding volume ratio of Bp to tetraethyl orthosilicate is about 32:60), continue Stir at 60°C and react for 24 hours; then, centrifuge the nanoparticles, wash them twice with ethanol, and dry them in vacuum to obtain photosensitive nano-silica.

[0057] Its TEM pictures are as Figure 1-a , Figure 1-b As shown, the particle size of the silica core is about 30nm, and the excess silane coupling agent makes the silica adhere to each other. Its infrared spectru...

Embodiment 2

[0059] (1) Preparation of nano-silica dispersion:

[0060] Mix 30ml of ethanol, 1.35ml of ammonia water and 0.6ml of deionized water, raise the temperature to 60°C, then add 1.5ml of tetraethyl orthosilicate to the solution, continue to stir and react at 60°C for 12 hours to obtain carbon dioxide Silicon nanoparticle dispersion.

[0061] (2) Surface modification of silica:

[0062] Add the toluene solution (the feed volume ratio of Bp and tetraethyl orthosilicate is about 16:60) of the Bp whose mass concentration is 200mg / ml to the silicon dioxide nanoparticle dispersion liquid that step (1) obtains, continue Stir at 60°C and react for 24 hours; then, centrifuge the nanoparticles, wash them twice with ethanol, and dry them in vacuum to obtain photosensitive nano-silica.

[0063] Its TEM pictures are as Figure 4-a , Figure 4-b As shown, the particle size of the silica core is about 30nm, and the excess silane coupling agent makes the silica adhere to each other. From i...

Embodiment 3

[0065] (1) Preparation of nano-silica dispersion:

[0066] Mix 30ml of ethanol, 1.35ml of ammonia water and 0.6ml of deionized water, raise the temperature to 60°C, then add 1.5ml of tetraethyl orthosilicate to the solution, continue to stir and react at 60°C for 12 hours to obtain carbon dioxide Silicon nanoparticle dispersion.

[0067] (2) Surface modification of silica:

[0068] Add the mass concentration of 0.5ml to the toluene solution of the Bp of 200mg / ml in the silica nanoparticle dispersion that step (1) obtains (the feeding volume ratio of Bp and tetraethyl orthosilicate is about 4:60), Continue to stir at 60° C. and react for 24 hours; after that, the nanoparticles are centrifuged, washed twice with ethanol, and dried in vacuum to obtain photosensitive nano-silicon dioxide.

[0069] Its TEM pictures are as Figure 5-a , Figure 5-b As shown, the particle size of the silica core is about 30nm, and the excess silane coupling agent makes the silica adhere to each o...

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Abstract

The invention relates to light-sensitive nanometer silicon dioxide and a method for preparing the same.The surfaces of the light-sensitive nanometer silicon dioxide contain covalently bonded groups shown as a formula, R1 and R2 in the formula represent independent hydroxyl or ethoxyl or nanometer particle surfaces -O-Si-.The light-sensitive nanometer silicon dioxide and the method have the advantages that the light-sensitive nanometer silicon dioxide contains a benzophenone group which is a photo-initiator, insertion reaction can be carried out on the benzophenone group and C-H bonds under ultraviolet irradiation conditions, accordingly, modified nanometer silicon dioxide and polymer substrates can be combined with one another by chemical bonds, agglomeration among nanometer particles can be prevented, the dispersibility of the nanometer particles in high-polymer matrixes can be improved, and the dispersion stability of the nanometer particles in the high-polymer matrixes can be enhanced; the light-sensitive nanometer silicon dioxide can be used as a filler to be added into high-polymer materials, is excellent in high-polymer matrix compatibility and can be connected with the high-polymer matrixes by covalent bonds after being irradiated by ultraviolet light, and the dispersion stability of the light-sensitive nanometer silicon dioxide in the high-polymer matrixes can be improved.

Description

technical field [0001] The invention relates to surface-modified nanoparticles and a preparation method thereof, in particular to a photosensitive nano silicon dioxide and a preparation method thereof. Background technique [0002] Nano silica is a non-toxic, odorless white amorphous powder, due to its unique small size effect, surface interface effect, quantum size effect, macro quantum tunnel effect and other properties, and low price, simple and mature preparation process, It is often used as high-efficiency thermal insulation materials, catalyst carriers, gas filter materials and fillers for high-grade coatings, etc. It is one of the most widely used nanomaterials at present. [0003] UV curing technology has the advantages of fast curing speed, energy saving, environmental protection, good coating performance, and low organic volatilization. It is the main development direction of future coatings. Filling nano-silica into UV-curable coatings can effectively improve the...

Claims

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Application Information

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IPC IPC(8): C08K9/06C08K3/36C09D7/12
CPCC08K9/06C08K3/36C08K2201/003C08K2201/011C09D7/62
Inventor 苏萃周勇曹诣宇董侠刘学新王笃金
Owner INST OF CHEM CHINESE ACAD OF SCI
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