Preparation method of single-layer nano-film memristor using LTCC green tape as substrate
A technology of nano-film and green ceramic tape, applied in the fields of nano-technology, nano-technology, nano-technology for information processing, etc., can solve the problems of hard memristor material, not yet commercialized production, unable to carry out hardware experiments, etc.
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[0109] Adopt the same preparation method of single-layer nanometer film memristor, adopt pulsed laser deposition PLD or magnetron sputtering method to use Au, Ag, Pt to plate electrode, this preparation method comprises the following steps:
[0110] Step 1, with Ba(Ti 1-y x y )O 3-y (X=Mg, Zn, Ca) is used as the target material, and the pulsed laser deposition PLD or magnetron sputtering method is used to coat the LTCC raw ceramic tape with the lower electrode Pt or Au in advance to form a resistive layer. The thickness of the coating is 10-990nm, then heat-treated at 700-900°C for 10-30 minutes;
[0111] In the second step, the target material is Au, Ag or Pt, using pulsed laser method or magnetron sputtering method, in Ba(Ti 1-y x y )O 3-y A layer of upper electrode is plated on the nano film.
[0112] 3, embodiment 13 adopts and embodiment 1 Ba(Ti 1-y x y )O 3-y The raw material formula of the target is the same; moreover, a layer of upper electrode is plated with In...
Embodiment 1
[0119] Preparation of Ba(Ti 1-y x y )O 3-y The raw material formula of the target is: Ba(NO 3 ) 2 : Ti(OC 4 h 9 ) 4 : X(NO 3 ) 2 =100:99:1 (molar ratio).
Embodiment 2
[0121] Preparation of Ba(Ti 1-y x y )O 3-y The raw material formula of the target is: Ba(NO 3 ) 2 : Ti(OC 4 h 9 ) 4 : X(NO 3 ) 2 =100:98:2 (molar ratio).
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