Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

Silicon/carbon composite, silicon alloy/carbon composite, and methods for producing the same

A technology of carbon composites and silicon alloys, which is applied in the direction of carbon silicon compound conductors, hybrid/electric double layer capacitors, hybrid capacitors, etc., can solve problems such as non-coating, and achieve excellent charge-discharge cycle characteristics.

Inactive Publication Date: 2016-05-04
LAIR LIQUIDE SA POUR LETUDE & LEXPLOITATION DES PROCEDES GEORGES CLAUDE
View PDF5 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, commercially available CNFs cannot be coated with silicon at a uniform thickness (for example, see Non-Patent Documents 1 and 2)

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Silicon/carbon composite, silicon alloy/carbon composite, and methods for producing the same
  • Silicon/carbon composite, silicon alloy/carbon composite, and methods for producing the same
  • Silicon/carbon composite, silicon alloy/carbon composite, and methods for producing the same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0089] Exemplary embodiments of the present invention are described in detail below. It should be noted that the present invention is not limited to the following exemplary embodiments. It should be understood that the present invention includes various modifications that may be made to the following exemplary embodiments without departing from the scope of the present invention.

[0090] 1. Methods for preparing silicon / carbon composites and silicon alloy / carbon composites

[0091] A method of preparing a silicon / carbon composite and a silicon alloy / carbon composite according to an embodiment of the present invention forms a CVD film on a surface of a conductive carbon material using a CVD film forming apparatus. The structure of a CVD thin film forming apparatus usable in connection with an embodiment of the present invention, and a method of producing a silicon / carbon composite and a silicon alloy / carbon composite according to an embodiment of the present invention are seq...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
lengthaaaaaaaaaa
diameteraaaaaaaaaa
Login to View More

Abstract

A silicon / carbon composite or a silicon alloy / carbon composite is formed with a homogeneous silicon-containing thin film or silicon-containing alloy thin film on the surface of a conductive carbon material, where the composite may be used for a large-capacity electrical storage device when used as a negative electrode material for forming an electrical storage device negative electrode, and exhibits excellent charge-discharge cycle characteristics. A carbon-containing thin film is formed on a surface of a conductive carbon material by chemical vapor deposition (CVD) that utilizes a carbon-containing gas and a silicon-containing thin film or a silicon-containing alloy thin film is formed on the conductive carbon material by chemical vapor deposition (CVD) that utilizes a silicon-containing gas alone, or utilizes a silicon-containing gas and a carbon-containing gas.

Description

technical field [0001] The present invention relates to a silicon / carbon composite (silicon-carbon composite), a silicon alloy / carbon composite (silicon alloy-carbon composite) and a preparation method thereof. More specifically, the present invention relates to a silicon / carbon composite in which a uniform silicon-containing thin film is formed on the surface of a conductive carbon material, a silicon alloy / carbon composite in which a uniform silicon-containing alloy thin film is formed on the surface of a conductive carbon material, and preparation thereof method. Background technique [0002] In recent years, high-voltage electric storage devices with high energy density have been desired as power sources for driving electronic devices. Lithium ion batteries, lithium ion capacitors, and the like are expected as the electric storage device. [0003] The use of materials with high lithium sorption capacity to achieve the output and energy density improvements required for...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01M4/133H01M4/134H01M4/1393H01M4/1395H01G11/32H01G11/86
CPCH01G11/32H01G11/86H01M4/133H01M4/134H01M4/1393H01M4/1395B82Y40/00C23C16/24C23C16/26C23C28/04H01B1/04H01G11/06H01G11/38H01G11/42H01G11/50H01M4/136H01M4/362H01M4/386H01M4/587Y02E60/10Y02E60/13
Inventor A·杜蒙特P·吉奈特大窪清吾
Owner LAIR LIQUIDE SA POUR LETUDE & LEXPLOITATION DES PROCEDES GEORGES CLAUDE
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com