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Statistical Process Control Method for Batch Processing of Wafers

A technology of statistical process control and batch processing, applied in the direction of comprehensive factory control, comprehensive factory control, electrical program control, etc., can solve problems such as false alarms, second-order nesting complexity, improvement, etc., and achieve the effect of improvement

Active Publication Date: 2018-03-06
CHENGDU RDW TECH CO LTD
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  • Abstract
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  • Claims
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Problems solved by technology

In this way, the sample data collected during the production process of batch processing wafers no longer obey the independent and same normal distribution, so if the traditional control chart is still used, a large number of false alarms will be generated
At the same time, the problem of second-order nesting is more complicated, so the traditional control chart cannot fully monitor all aspects that need to be monitored for batch processing wafers, and cannot achieve the improvement of batch processing wafer quality

Method used

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  • Statistical Process Control Method for Batch Processing of Wafers
  • Statistical Process Control Method for Batch Processing of Wafers
  • Statistical Process Control Method for Batch Processing of Wafers

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Embodiment Construction

[0054] The following is a further description of the present invention by taking the batch processing of wafers for producing 3AQ151024 integrated circuit chips as an example in conjunction with the drawings.

[0055] Reference figure 1 , The implementation steps of the present invention are as follows:

[0056] Step 1: Collect samples.

[0057] 1.1) Place the 3AQ151024 integrated circuit chip wafer in a diffusion furnace numbered 11C for bulk phosphorus diffusion;

[0058] 1.2) After the phosphorus is diffused, first select such as figure 2 3 wafers are extracted from the 3 fixed positions shown; then the square resistance is measured at the 5 fixed positions on the extracted wafer for sample data collection, such as image 3 Shown

[0059] 1.3) 25 batches of sample data are obtained after 25 consecutive collections. Each batch has 3 sub-batch and each sub-batch has 5 sample data. As shown in Table 1, record the l sample data of the jth subbatch of the i batch X ijl , Where i=1, 2,....

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Abstract

The invention discloses a statistical process control method for batch processing wafers, which mainly solves the problem that the existing control chart cannot implement statistical process control for batch processing wafers. The implementation steps are: 1. After batch processing of wafers for the same product in the corresponding processing furnace, collect sample data and obtain the mean and standard deviation of each sub-batch; 2. Calculate the second-order nesting from the mean and standard deviation of the sub-batch According to the corresponding eigenvalues ​​of the four control charts in the control chart, the control lines of the four control charts in the second-order nested control chart are obtained; 3. According to the drawing method of the Shewhart control chart, draw the eigenvalues ​​and control lines to the corresponding Control chart; 4. Judging the four control charts in step 3 by applying the judgment process abnormality criterion, and obtaining the result of whether the production process of batch processing wafers is in a controlled state. The invention can comprehensively monitor wafer batch processing, has a diagnosis function, improves wafer processing quality, and can be used for wafer batch production.

Description

Technical field [0001] The invention belongs to the field of semiconductor technology, and particularly relates to a method for controlling the statistical process of wafer processing, which can be used for quality improvement of wafer batch processing. Background technique [0002] "Statistical process control" is one of the most popular and effective quality improvement methods today. Statistical process control technology mainly refers to the use of Shewhart’s process control theory, control chart, to monitor the various stages of the production process, that is, the quality characteristics of the process. According to the point distribution on the control chart, analyze the trend of quality characteristics and adopt Preventive measures to ensure that the production process is under statistical control to achieve the purpose of improvement and quality assurance. However, the prerequisite for the application of traditional control charts is that the data of each batch of sampl...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G05B19/418
CPCY02P90/02
Inventor 游海龙田文星顾凯贾新章
Owner CHENGDU RDW TECH CO LTD
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