Copper electroplating dissolving solution and rapid high-depth blind hole filling process
A solution and copper electroplating technology, applied in the field of circuit boards, can solve the problems of low hole filling rate and uneven copper plating layer, and achieve the effect of high hole filling rate, good ductility and high toughness
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[0015] The following will clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only some of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0016] Embodiments of the invention include:
[0017] A rapid hole filling process for high-depth blind holes using electroplating copper solution, comprising the following steps:
[0018] Configure electroplating copper solution: use 20L wetting agent, 100L brightener, 100L leveling agent, 2 tons of copper sulfate pentahydrate solution, 2 tons of sulfuric acid solution and 20L hydrochloric acid solution to mix, measure the concentration, add pure water to adjust, so that the electroplating The content of copper sul...
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