Amplification module formed by integration of transistor and film bulk acoustic resonators
A thin-film bulk acoustic wave and amplifier module technology, which is applied in the fields of semiconductors, microelectronics and communications, to achieve the effects of small space, small size, and reduced harmonic power loss
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Embodiment 1
[0060] Figure 4A It is a cross-sectional view of an amplification module integrated with a transistor and a thin-film bulk acoustic resonator provided in Embodiment 1 of the present invention. Such as Figure 4A As shown, the amplifying module integrates a transistor 401 and a group of thin film bulk acoustic resonators 402 into one structure. Wherein, the thin film bulk acoustic resonator includes a thin film bulk acoustic resonator structure.
[0061] The transistors may be gallium nitride high electron mobility transistors, gallium arsenide high electron mobility transistors, metal oxide field effect transistors, lateral metal oxide field effect transistors, or junction transistors. The input terminal, the output terminal and the ground terminal of the transistor are respectively the gate, the drain and the source of the transistor or the base, the collector and the emitter of the transistor. The following describes an example where the transistor is a gallium nitride h...
Embodiment 2
[0070] Figure 5A It is a cross-sectional view of an amplification module integrated with a transistor and a thin-film bulk acoustic resonator provided in Embodiment 2 of the present invention. Such as Figure 5A As shown, the difference from the amplification module provided in Embodiment 1 of the present invention is that the back gold layer 403 and the part of the substrate 404 extending beyond the buffer layer of this amplification module are located outside the source electrode 407 . The thin film bulk acoustic resonator 402 is located on the extended portion of the substrate 404 . The upper electrode 414 of the film bulk acoustic resonator 402 is electrically connected to the gate 412 of the transistor 401 through the conductive metal 420. In addition, in order to realize the electrical insulation between the conductive metal 420 and the source 407, nitrogen is arranged between the conductive metal 420 and the source 407. SiO layer 421. In order to reduce the influenc...
Embodiment 3
[0075] Image 6 It is a cross-sectional view of an amplification module integrated with a transistor and a thin-film bulk acoustic resonator provided in Embodiment 3 of the present invention. Such as Image 6 As shown, different from the amplifying module provided in Embodiment 2 of the present invention, this amplifying module does not include the second isolation layer and the third through hole, and the lower electrode 415 of the thin film bulk acoustic resonator 402 is directly connected to the source 407 of the transistor 401. contact to achieve electrical connection. This structural design makes the bottom electrode 415 of the film bulk acoustic resonator 402 and the source 407 of the transistor 401 share the first through hole 413, so that both are electrically connected to the back gold layer 403, and the third through hole is not needed.
[0076] Compared with the amplifying module provided in Embodiment 2 of the present invention, the amplifying module provided in ...
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