Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Cold and hot mask applying device with ventilation structure

A technology of hot and cold compresses and facial masks, which is applied in the field of daily necessities, can solve the problems of single function of facial masks, high temperature, and easy to burn the user's face, etc., and achieve the effects of improving the use effect, ensuring consistency, and uniform temperature

Active Publication Date: 2015-05-27
TAIZHOU TAI CHENG ELECTRONICS TECH
View PDF18 Cites 10 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The above-mentioned mask can change its own temperature, but it also has defects. It can only use air contact to increase the temperature, which cannot achieve real-time control, and can only be heated in one direction but cannot be cooled, resulting in a single function of the mask.
[0006] In addition, the above-mentioned mask that can be heated is not designed with a breathable structure inside, resulting in poor internal air circulation, making a certain part of the mask overheated, resulting in easy burns to the user's face

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Cold and hot mask applying device with ventilation structure
  • Cold and hot mask applying device with ventilation structure
  • Cold and hot mask applying device with ventilation structure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0034] The following are specific embodiments of the present invention and in conjunction with the accompanying drawings, the technical solutions of the present invention are further described, but the present invention is not limited to these embodiments.

[0035] Such as figure 1 , figure 2 , image 3 and Figure 4 Shown, this facial mask device comprises superimposed facial mask sheet 1 and outer membrane sheet 25, and facial mask sheet 1 and outer membrane sheet 25 all have the through hole 23 that can expose user's eyes, nose and mouth, and facial mask sheet A plurality of protruding points 28 are distributed on the 1, and the bottom of the protruding points 28 is fixedly connected on the mask patch 1, and the top of the protruding points 28 can abut against the inner surface of the outer membrane 25. The function of bumps 28 makes the part between the mask patch 1 and the outer membrane 25 not stick tightly, ensures the air circulation between the two, improves the h...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Heightaaaaaaaaaa
Outer diameteraaaaaaaaaa
Login to View More

Abstract

The invention provides a cold and hot mask applying device with a ventilation structure, belongs to the technical field of articles for daily life, and aims at solving the technical problems of an existing cold and hot applied mask that the surface temperature is not uniform and the like. The mask applying device comprises a mask patch and an outer mask piece which are overlapped; the mask patch and the outer mask piece are provided with through holes for exposing eyes, nose and mouth of a user; the mask patch is provided with a temperature adjusting mechanism for heating or cooling the mask patch; a plurality of inner air vents which penetrate through the mask patch are formed in the mask patch; a plurality of outer air vents which penetrate through the outer mask piece are formed in the outer mask piece. According to the mask device, the inner air vents penetrate through the mask patch and the outer air vents penetrate through the outer mask piece, so that air between the mask patch and the outer mask piece can be exchanged with the outside air for uniformly dispersing surplus heat, and furthermore, the consistency of the temperatures of all parts of the mask patch is guaranteed, and the surface temperature of the cold and hot applied mask is uniformed.

Description

technical field [0001] The invention belongs to the technical field of daily necessities, and relates to a cold and hot compress facial mask device with an air-permeable structure. Background technique [0002] Ordinary facial mask is a carrier of beauty care products. It is applied on the face for 15 to 30 minutes. When the nutrients of the skin care products are slowly absorbed by the skin, the film will be removed. The materials of the mask are powder blended, kaolin, Non-woven fabrics, silk masks, bio-cellulose masks. It is widely used at present. [0003] The principle of the mask is to use the short time covered on the face to temporarily isolate the outside air and pollution, increase the temperature of the skin, expand the pores of the skin, promote the secretion and metabolism of sweat glands, increase the oxygen content of the skin, and help the skin to eliminate the skin. The products of cell metabolism and accumulated oily substances, the moisture in the mask p...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): A61F7/00A61H23/02
Inventor 吴海荣张建文
Owner TAIZHOU TAI CHENG ELECTRONICS TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products