Preparation method of electrical insulating layer material for photoinduced self-repair of micro-discharge defects
An electrical insulation and self-repairing technology, applied in the preparation of microspheres, microcapsule preparations, etc., can solve the problems of retention, high reactivity, and degradation of overall material performance, and achieve the effect of ensuring insulation strength
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[0014] The preparation method of the electrical insulating layer material of micro-discharge defect photoinduced self-repairing proposed by the present invention comprises the following steps:
[0015] (1) uniformly mix the photosensitive resin, photosensitive resin reactive diluent and photoinitiator to obtain a mixture, the mass percentage of the photosensitive resin in the mixture is 55% to 85%, and the photosensitive resin reactive diluent in the mixture The mass percentage is 10%-40%, and the mass percentage of the photoinitiator in the mixture is 3%-5%; the surface-modified nano-titanium dioxide is dispersed in deionized water by an ultrasonic processor to obtain the first solution, The mass percent concentration of the nano-titanium dioxide is 0.5% to 2%; polyvinyl alcohol is added to the above-mentioned first solution to obtain a second solution, and the mass percent concentration of the polyvinyl alcohol is 0.05% to 0.1%; to the above-mentioned Add the above mixture i...
Embodiment 1
[0026] (1) Photosensitive resin bisphenol A epoxy acrylate, photosensitive resin reactive diluent trimethylolpropane triacrylate (TMPTA) and photoinitiator 184 are uniformly mixed to obtain a mixture, and the mass percentage of the photosensitive resin in the mixture 55%, the mass percentage of the photosensitive resin reactive diluent in the mixture is 40%, and the mass percentage of the photoinitiator in the mixture is 5%; the surface-modified nano-titanium dioxide is dispersed by an ultrasonic processor In deionized water, obtain the first solution, the mass percentage concentration of described nano titanium dioxide is 0.5%; Add polyvinyl alcohol to above-mentioned first solution, obtain the second solution, the mass percentage concentration of described polyvinyl alcohol is 0.1% %; Add the above-mentioned mixture to the above-mentioned second solution, stir and emulsify with a rotating speed of 1000r / min, the stirring time is 20min, and form a uniformly dispersed oil-in-wa...
Embodiment 2
[0030] (1) Photosensitive resin novolac epoxy acrylate, photosensitive resin reactive diluent-1,6-hexanediol diacrylate (HDDA) and photoinitiator 1173 are uniformly mixed to obtain a mixture, and the quality of the photosensitive resin in the mixture is The percentage is 85%, the mass percentage of the photosensitive resin reactive diluent in the mixture is 10%, and the mass percentage of the photoinitiator in the mixture is 5%; Dispersed in deionized water to obtain the first solution, the mass percent concentration of the nano-titanium dioxide is 2%; polyvinyl alcohol is added to the above-mentioned first solution to obtain the second solution, the mass percent concentration of the polyvinyl alcohol is 0.05%; add the above-mentioned mixture to the above-mentioned second solution, stir and emulsify at a speed of 2500r / min, and the stirring time is 20min to 40min to form a uniformly dispersed oil-in-water core material emulsion, and the amount of the mixture added is the second...
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