Linear evaporation source

Abstract

The invention provides a linear evaporation source. The linear evaporation source comprises a heating cavity for accommodating a vapor deposition material, a mixing cavity which is positioned above the heating cavity and is used for mixing steam of the vapor deposition material, and a passage for communicating the heating cavity and the mixing cavity, wherein one end of the mixing cavity is communicated with the heating cavity through the passage, and a plurality of nozzles for spraying the steam of the vapor deposition material are arranged at the other end of the mixing cavity; heaters are respectively arranged on the peripheries of the heating cavity, the mixing cavity, the passage and the nozzles. According to the linear evaporation source provided by the invention, the heating of the vapor deposition material and the mixing of material steam are carried out in two independent spaces, so that the thickness of a vapor deposition film can be controlled to be higher in uniformity.

Description

technical field [0001] The invention relates to an evaporation source, in particular to a linear evaporation source capable of ensuring uniform thickness of an evaporation film. Background technique [0002] In the OLED (Organic Light Emitting Diode) manufacturing process, as the size of the evaporation substrate becomes larger, in order to ensure the uniformity of the thickness of the evaporation film and take into account the improvement of material utilization, the evaporation source used by the evaporation equipment has changed from the original point The source (point source) is replaced with a linear source (linear source). [0003] Such as figure 1 and figure 2 As shown, the currently used linear source is generally composed of a crucible 1 and a plurality of nozzles 2 arranged above the crucible 1. A heating wire 3 is provided on the outer periphery of the crucible 1 and the nozzles 2. By heating the crucible 1, the vapor deposition therein The material turns in...

AI Technical Summary

Problems solved by technology

[0004] The current linear evaporation source is heated and mixed with the steam in the crucible at the same time, and the space for steam mixing and homogenization is limited. It is easy for the material steam to be ejected from the nozzle before it has time to be uniform, which will lead to the uniformity of the thickness of the evaporation film. become worse

Especially for crucibles that have just been filled with materials, the space available for material vapor equalization pressure is more limited, which has a greater impact on the uniformity of evaporated film thickness

Moreover, the heating wire of the current evaporation source is segmented heating, and the heating method is complicated

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