Optical system and exposure machine

An optical system and optical mirror technology, applied in the field of exposure machines, can solve the problems of parallelism of ultraviolet exposure lamps and poor energy uniformity, and achieve the effect of improving work efficiency

Inactive Publication Date: 2015-03-18
SHENNAN CIRCUITS
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] The purpose of the present invention is to provide an optical system with a UV-LED surface light source assembly that provides a surface light source, aiming to solve the problems of poor parallelism and energy uniformity of ultraviolet exposure lamps in the prior art

Method used

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  • Optical system and exposure machine
  • Optical system and exposure machine
  • Optical system and exposure machine

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Embodiment Construction

[0022] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0023] Please also refer to figure 1 The optical system 10 provided in the specific embodiment of the present invention is used for pattern transfer, and the optical system 10 includes a UV-LED surface light source assembly 11 for emitting ultraviolet light to provide a surface light source, and a UV-LED surface light source assembly 11 for reflecting UV-LED surface light source. The cold mirror 12 that emits the ultraviolet light, receives and transmits the compound eye homogenization component 13 of the ultraviolet light reflected by the cold mirror 12, receives the ultraviolet light transmitted ...

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Abstract

The invention is applicable to the technical field of optics, and provides an optical system, aiming at solving the problems that an ultraviolet exposure lamp is poor in parallelism degree and energy uniformity in the prior art. The optical system comprises a UV-LED area light source component for offering an area light source, a cold light mirror for reflecting ultraviolet light emitted from the UV-LED area light source component, a compound eye light evening component for receiving and transmitting the ultraviolet light reflected from the cold light mirror, an optical mirror for receiving the ultraviolet light transmitted from the compound eye light evening component and transmitting and / or reflecting the ultraviolet light, and a reflector for receiving the ultraviolet light reflected from the optical mirror, wherein the reflector is used for reflecting the received ultraviolet light to the surface of a negative film for pattern transfer. Furthermore, the invention also provides an exposure machine. According to the optical system, since the UV-LED area source component is used for emitting the ultraviolet light and offering the area light source, and the ultraviolet light is transmitted onto the surface of the negative film in a parallel manner after being reflected by virtue of a light system, the parallelism degree and the energy uniformity of the incident ultraviolet light can be guaranteed.

Description

technical field [0001] The invention belongs to the field of optical technology, and in particular relates to an optical system and an exposure machine with the optical system. Background technique [0002] Printed Circuit Board (PCB), also known as printed circuit board or printed circuit board, is an important electronic component, a support for electronic components, and a provider of electrical connections for electronic components. Because it is made using electronic printing, it is called a "printed" circuit board. [0003] Printed circuit boards need to go through multiple processes in the production process to get the final product. Among them, an important process is to use optical exposure to transfer images between negatives and printed circuit boards, and the exposure machine is the key equipment for image transfer. , The quality and precision of the printed circuit board depend largely on the exposure quality. Within the effective exposure area of ​​the exposu...

Claims

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Application Information

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IPC IPC(8): G03F7/20
Inventor 闵秀红罗亿龙陈于春孙键刘小根曹阳胡楚金
Owner SHENNAN CIRCUITS
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