Method for producing multilayer structure, multilayer structure and electronic device
A technology of lamination structure and manufacturing method, which is applied to lamination devices, lamination, electronic equipment, etc., can solve problems such as prolonged time and temperature rise, and achieve the effect of inhibiting peeling
Inactive Publication Date: 2015-03-04
SONY CORP
View PDF1 Cites 9 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
no. 1 approach
[0074] 1. First Embodiment (Laminated Structure and Manufacturing Method Thereof)
[0075] 2. Second Embodiment (Laminated Structure and Manufacturing Method Thereof)
no. 3 approach
[0076] 3. Third Embodiment (Laminated Structure and Manufacturing Method Thereof)
no. 4 approach
[0077] 4. Fourth Embodiment (Laminated Structure and Manufacturing Method Thereof)
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
Property | Measurement | Unit |
---|---|---|
thickness | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
width | aaaaa | aaaaa |
Login to View More
Abstract
A multilayer structure is produced by bonding one or more graphene layers (12), which are formed on a first substrate (11), and a second substrate (13) with each other by a roll-to-roll method by means of an adhesive layer (14) that is formed of a delayed ultraviolet-curable resin. A metal foil is used as the first substrate (11), while a transparent substrate is used as the second substrate (13).
Description
technical field [0001] The present disclosure relates to a manufacturing method of a laminated structure, a laminated structure, and an electronic device, and is preferably applied to, for example, transparent conductive films used in displays and touch panels, and various electronic devices respectively including the transparent conductive films. Background technique [0002] Graphene including carbon atoms of single-layer graphite is expected as a transparent conductive material or a wiring material due to its high conductivity. In particular, graphene synthesized by a thermal CVD method attracts attention because a film can be formed over a large area while controlling the number of layers. [0003] In the synthesis method of graphene by thermal CVD method, graphene is formed on a metal catalyst substrate, usually on a copper foil. Therefore, the formed graphene needs to be transferred from the metal catalyst substrate to the desired substrate. [0004] As a transfer me...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B32B37/20B32B7/04B32B9/00G06F3/041H01B5/14H01B13/00
CPCB32B9/00B32B37/12G06F3/041B32B2311/00B32B2307/412B32B2313/04B32B7/04B32B37/20B32B2457/20B32B2457/208B32B9/007B32B9/045B32B15/08B32B15/20B32B27/16B32B2255/10Y10T428/30B32B7/12B32B2255/20B32B2255/28B32B2307/202B32B2457/00B32B37/0053B32B37/025B32B38/0008B32B38/10B32B2037/1253B32B2038/0076B32B2250/02B32B2310/0831H01B1/18
Inventor 清水圭辅木村望
Owner SONY CORP
Who we serve
- R&D Engineer
- R&D Manager
- IP Professional
Why Patsnap Eureka
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com