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A Large Numerical Aperture Projection Optical System Containing Two Mirrors

A projection optical system and numerical aperture technology, applied in the field of projection optics, can solve problems such as material type limitations, achieve good imaging characteristics, reduce the difficulty of assembly and integration, and improve the effect of lithography resolution

Inactive Publication Date: 2017-01-18
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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  • Abstract
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Problems solved by technology

[0007] It can be seen from the above formula that in order to obtain higher resolution, it can be achieved by shortening the wavelength of the light source or increasing the numerical aperture of the projection lithography objective lens. However, when the wavelength of the light source is shortened, the optical glass absorbs light and is used for projection. The material types of lithography objective lens will be greatly limited

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  • A Large Numerical Aperture Projection Optical System Containing Two Mirrors

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Embodiment Construction

[0033] In order to better illustrate the purpose and advantages of the present invention, the present invention will be further described below in conjunction with the accompanying drawings and specific embodiments.

[0034] figure 1 It is a schematic diagram of the layout of the large numerical aperture projection optical system of the present invention. 26 optical elements form the transmission group G1, the transmission group G2, the transmission group G3, the transmission group G4, the reflection group G5, the transmission group G6, the transmission group G7, and the transmission group G8. Set from the beam incident direction.

[0035] The transmission group G1 is a unit group with a positive focal length, including the first positive lens 1, the second positive lens 2, the third positive lens 3, and the fourth positive lens 4. The light is projected from the object plane and converged by the transmission group G1 before entering the transmission group G2.

[0036] The t...

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Abstract

The invention provides a large-numerical-aperture projection optical system comprising two reflecting mirrors. The projection optical system is used for imaging images on an object plane into an image plane. The large-numerical-aperture projection optical system comprising the two reflecting mirrors comprises the two ellipsoid reflecting mirrors coaxially placed and seven transmission sets in the optical axis direction. The transmission set G1 with the positive focal distance, the transmission set G2 with the positive focal distance, the transmission set G3 with the positive focal distance, the transmission set G4 with the positive focal distance, the transmission set G5 with the negative focal distance, the transmission set G6 with the negative focal distance, the transmission set G7 with the positive focal distance and the transmission set G8 with the positive focal distance are sequentially arrayed in the incidence direction of light beams. The large-numerical-aperture projection optical system comprising the two reflecting mirrors has the advantages that the numerical aperture is large, and the imaging quality is good.

Description

technical field [0001] The invention relates to a projection optical system with a large numerical aperture used in a lithography process and a semiconductor element manufacturing device, and belongs to the technical field of projection optics. Background technique [0002] Lithography is an integrated circuit manufacturing technology. It uses the principle of optical projection image to transfer the high-resolution graphics on the mask plate to the optical exposure process of the rubber-coated silicon wafer by means of exposure. Almost all integrated circuits Fabrication is done using optical projection lithography. [0003] With the continuous advancement of science and technology, various types of semiconductor chips are widely used in aerospace, military, and civilian fields such as computers. With the continuous improvement of equipment performance requirements, the resolution requirements for semiconductor chips are getting higher and higher. At present, the manufactu...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B13/18G02B13/00G03F7/20
CPCG02B13/0045G03F7/7025
Inventor 白瑜邢廷文邓超朱红伟吕保斌廖志远
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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