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High-lift device optimum design method taking motion locus into account

A technology of increasing the lift device and motion trajectory, which is applied in the field of transport aircraft, and can solve problems such as difficulty in obtaining a satisfactory take-off configuration, increasing the complexity and size of the motion mechanism, and increasing the size of the rectification device of the motion mechanism, etc.

Active Publication Date: 2015-02-18
CHINA ACAD OF AEROSPACE AERODYNAMICS
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Problems solved by technology

Doing so will make it difficult to obtain satisfactory take-off configuration performance, and sometimes increase the complexity and size of the kinematic mechanism, which will not only bring about no change to the design of the kinematic mechanism, but also increase the size of the kinematic mechanism rectification device, resulting in unnecessary resistance loss

Method used

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  • High-lift device optimum design method taking motion locus into account
  • High-lift device optimum design method taking motion locus into account
  • High-lift device optimum design method taking motion locus into account

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Embodiment Construction

[0032] The present invention will be described in detail below in conjunction with the accompanying drawings.

[0033] The high-lift device is composed of leading edge slats, main wing and trailing edge flaps, and is an important part of the wing. The trailing edge flap can be divided into single-slot flap and multi-slot flap. During take-off and landing, the slats and flaps of the wings deflect forward and backward respectively under the drive of the motion mechanism, which provides enough aerodynamic force for the aircraft. In the process of aerodynamic design of the high-lift device, the design of the two-dimensional high-lift device should be carried out firstly according to the two-dimensional airfoil profile of the wing.

[0034] Step 1: Design the aerodynamic shape of the two-dimensional high-lift device on the basis of the two-dimensional airfoil;

[0035] The Bezier curve is used to design the surface shape of the high-lift device, and its expression is:

[0036] ...

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Abstract

The invention discloses a high-lift device optimum design method taking a motion locus into account. The method comprises the concrete steps as follows: 1. conducting a two-dimensional high-lift device aerodynamic configuration design on the basis of a two-dimensional airfoil profile; 2. conducting a two-dimensional motion mechanism motion locus design; 3. obtaining the aerodynamic configuration in a take-off state, the aerodynamic configuration in a landing state and the slot parameters of the airfoil profile; 4. computing the two-dimensional aerodynamic force of a high-lift device; 5. optimizing the slot parameters of the high-lift device, repeating Step 2 to Step 4, and optimizing the geometrical parameters of a motion mechanism meeting take-off and landing aerodynamic performance requirements as well as the drift angle of the airfoil profile until the optimal results are obtained. According to the method, the slot parameters of the take-off configuration and the landing configuration are obtained by simulating the whole motion locus curve of the motion mechanism of the high-lift device, and the synchronous optimum design of the take-off configuration and the landing configuration of the high-lift device can be realized on the basis of ensuring locus realization.

Description

technical field [0001] The invention relates to an optimal design method of a high-lift device, in particular to an optimal design method of a high-lift device considering a motion trajectory, and belongs to the technical field of transport aircraft. Background technique [0002] The performance of the high-lift device is one of the important indicators to measure the design level of a civil airliner, which is related to the safety, economy and environmental protection of the aircraft. The design of the high-lift device requires obtaining the required lift in the simplest form possible, the take-off configuration requires the resistance to be as small as possible to meet the requirements of the take-off field, and the landing configuration requires high lift and high resistance. [0003] The high-lift device needs to be deflected to the take-off and landing configuration under the actuation of the kinematic mechanism. The takeoff configuration and the landing configuration ...

Claims

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Application Information

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IPC IPC(8): B64F5/00
Inventor 郝璇苏诚张卫民
Owner CHINA ACAD OF AEROSPACE AERODYNAMICS
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