Vacuum refueling horizontal linear evaporation source

An evaporation source and level technology, applied in vacuum evaporation plating, sputtering plating, ion implantation plating, etc., can solve the problem that the evaporation source cannot be replaced or replenished raw materials online, continuous production, evaporation temperature and evaporation The rate is difficult to control and other problems, to achieve the effect of multi-point controllable heating of raw materials, convenient evaporation temperature and evaporation rate, and simple structure

Inactive Publication Date: 2014-08-06
BEIJING SEVENSTAR ELECTRONICS CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Traditional evaporation sources cannot replace or replenish raw materials on-line, and continuous production cannot be realized
At the same time, a single heating method is used, and the evaporation temperature and evaporation rate are difficult to control

Method used

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  • Vacuum refueling horizontal linear evaporation source
  • Vacuum refueling horizontal linear evaporation source
  • Vacuum refueling horizontal linear evaporation source

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Embodiment Construction

[0050] In order to make the purpose, content and advantages of the present invention clearer, the specific implementation manners of the present invention will be further described in detail below in conjunction with the accompanying drawings and examples. The following examples are only used to illustrate the technical solution of the present invention more clearly, but not to limit the protection scope of the present invention.

[0051] Such as Figure 1-6 As shown, the object of the present invention is to solve the above-mentioned problems, and propose a vacuum refueling horizontal linear evaporation source, which overcomes the above-mentioned problems.

[0052] The purpose of the present invention is achieved through the following technical solutions: a vacuum refueling horizontal linear evaporation source, including a sublimation chamber storage vacuum chamber and its vacuum system, a sublimation chamber replacement and supply system, a device control system, and an evap...

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Abstract

The invention relates to a vacuum refueling horizontal linear evaporation source. The evaporation source employs horizontal linear down-blowing evaporation, has evaporation width of 300 mm and is applicable to evaporation of nonmetal elements with a sublimation temperature of lower than 2500 DEG C. The vacuum refueling horizontal linear evaporation source has the advantages of a small size, a simple structure, low manufacturing cost, capacity of realizing on-line continuous supply or replacing of raw materials, multi-point and controllable heating of raw materials, etc.

Description

technical field [0001] The invention belongs to the field of vacuum technology, and is specifically used for vacuum coating equipment. Background technique [0002] At present, in the production of vacuum coating, vacuum evaporation technology has become one of the main technologies. The principle is: the film material is placed in a vacuum, heated by the evaporation source to evaporate, and the atoms or molecules of the vapor escape from the surface of the evaporation source, reach the surface of the substrate to be plated, and form a thin film after condensation. Depending on the type of film to be coated, this technology involves industries such as solar energy, electronic products, and daily necessities, and related evaporation coating equipment is also developing rapidly. The evaporation source part is the core of the coating system. Therefore, the design and manufacturing capabilities of evaporation sources play a vital role in the development of a complete set of co...

Claims

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Application Information

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IPC IPC(8): C23C14/24C23C14/56C23C14/54
CPCC23C14/246
Inventor 蔡勇金晨
Owner BEIJING SEVENSTAR ELECTRONICS CO LTD
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