High-performance liquid crystal photomask and application thereof

A photomask, high-performance technology, applied in the field of photomask, can solve the problem of no application, etc., achieve the effect of wide application range, reduce production cost, and improve plate making precision

Active Publication Date: 2014-07-30
十二秒融媒体(山东)有限公司
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, the above-mentioned masks are all used in the field of lithography, and have no application in the field of printing

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • High-performance liquid crystal photomask and application thereof
  • High-performance liquid crystal photomask and application thereof
  • High-performance liquid crystal photomask and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] see figure 1, this specific embodiment 1 provides a high-performance liquid crystal photomask, characterized in that the photomask includes an imaging controller (not shown), a light uniform layer 107, a light guide layer 106, a first optical A deflector 101, a liquid crystal layer 103 and a second optical deflector 102; the liquid crystal layer 103 is sandwiched between the first optical deflector 101 and the second optical deflector 102; the liquid crystal layer 103 is a twisted nematic liquid crystal layer. A first transparent electrode layer 104 is provided on the surface of the first optical deflector 101 in contact with the liquid crystal layer 103 ; a second transparent conductive layer 105 is provided on the surface of the second optical deflector 102 in contact with the liquid crystal layer 103 . The light guide layer 106 organizes the incident light into parallel light, and the parallel light enters the first optical deflection film 101 , and the light guide ...

Embodiment 2

[0037] see image 3 , this specific embodiment 2 provides a kind of high-performance liquid crystal photomask, it is characterized in that, described photomask comprises, imaging controller, light uniform layer 207, light guiding layer 206, first optical deflection plate 201, liquid crystal layer 203 and the second optical deflector 202; the liquid crystal layer 203 is sandwiched between the first optical deflector 201 and the second optical deflector 202; the liquid crystal layer 203 is a twisted nematic liquid crystal layer. A first transparent electrode layer 204 is arranged on the surface of the first optical deflector 201 in contact with the liquid crystal layer 203; a second transparent conductive layer 205 is arranged on the surface of the second optical deflector 202 in contact with the liquid crystal layer 203; The angle between the polarization direction of the optical deflector 201 and the second optical deflector 202 is 90 degrees; the light guide layer 206 is arra...

Embodiment 3

[0041] see Figure 4 , this specific embodiment, 3 provides a kind of high-performance liquid crystal photomask, it is characterized in that, described photomask comprises, imaging controller, light homogeneous layer 307, light guiding layer 306, first optical deflection plate 301, A liquid crystal layer 303 and a second optical deflection film 302; the liquid crystal layer is sandwiched between the first optical deflection film 301 and the second optical deflection film 302; the liquid crystal layer 303 is a twisted nematic liquid crystal layer. A first transparent electrode layer 304 is arranged on the surface of the first optical deflector 301 in contact with the liquid crystal layer 303; a second transparent conductive layer 305 is arranged on the surface of the second optical deflector 302 in contact with the liquid crystal layer 303; The angle between the polarization direction of the optical deflector 301 and the second optical deflector 302 is 90 degrees; the light gui...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a high-performance liquid crystal photomask and application thereof. The photomask comprises an imaging controller, a light equalizing layer, a light guide layer, a first optical deflector, a liquid crystal layer and a second optical deflector, wherein the liquid crystal layer is clamped between the first optical deflector and the second optical deflector; a first transparent electrode layer is arranged on the surface, in contact with the liquid crystal layer, of the first optical deflector; a second transparent conducting layer is arranged on the surface, in contact with the liquid crystal layer, of the second optical deflector; the included angle of the polarization directions of the first optical deflector and the second optical deflector is 90 degrees; the light guide layer is arranged on the light incidence side of the first optical deflector, and the light equalizing layer is arranged on the light incidence side of the light guide layer. The liquid crystal photomask provided by the invention can realize multi-photomask overprinting without changing the photomask, has high and adjustable precision and great stability and can be operated for a long time.

Description

technical field [0001] The invention relates to a photomask, in particular to a high-performance liquid crystal photomask and its application. Background technique [0002] In the printing process, plate making is the link that takes the longest time, the most complicated process, and the highest cost in the whole process. Accurate plate making is the key to high-quality printing; One of the most important links in the circuit board preparation process is also the most expensive part of the entire process. There are four common photomasks, chrome plate, dry plate, letterpress and liquid letterpress. The photomask is mainly composed of two parts, a light-transmitting substrate and an opaque material. The existing mask plates, once prepared, have fixed light-shielding and light-transmitting regions, so they are only suitable for specific devices to be exposed. Depending on the complexity of the prepared devices, multiple sets of photomasks are usually required to realize th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/1333G02F1/1335G02F1/13357G03F1/00G03F7/20
Inventor 杨涛
Owner 十二秒融媒体(山东)有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap