Low temperature gas supply device, heat transfer medium-cooling device, and low temperature reaction control device

A low-temperature gas and supply device technology, applied in gas and gas/vapor mixing, household refrigeration devices, applications, etc., can solve the problems of flow pulsation, temperature instability, low temperature gas temperature instability, etc., to achieve stable temperature control and expansion Select range, avoid specific effects

Active Publication Date: 2014-06-18
NIPPON SANSO CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when a simple mixer is used, there is a problem of temperature instability and pulsation in the mixed cryogenic gas
For example, since the temperature difference between liquefied nitrogen and normal temperature nitrogen is large, and liquefied nitrogen has a large low-temperature heat with a small flow rate, it is difficult to control the small flow rate, and the pulsation of the flow rate due to the mixed low-temperature nitrogen gas Or temperature instability caused by poor mixing
In order to solve the above-mentioned problems, for example, an efficient or large mixer disclosed in Patent Document 3 is required, and causes an increase in the cost of the equipment

Method used

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  • Low temperature gas supply device, heat transfer medium-cooling device, and low temperature reaction control device
  • Low temperature gas supply device, heat transfer medium-cooling device, and low temperature reaction control device
  • Low temperature gas supply device, heat transfer medium-cooling device, and low temperature reaction control device

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no. 1 approach ）

[0058] First, the configurations of the low-temperature gas supply device 100A, the heating medium cooling device 200A, and the low-temperature reaction control device 300A according to the first embodiment to which the present invention is applied will be described. figure 1 It is a system diagram of the first embodiment of the low-temperature gas supply device, the heating medium cooling device, and the low-temperature reaction control device of the present invention.

[0059] Such as figure 1 As shown, the low-temperature gas supply device 100A according to the first embodiment of the present invention includes a normal-temperature path 1A through which a normal-temperature nitrogen gas (GN) which is a high-temperature gas compared with a low-temperature liquefied gas described later is introduced from one end. 2 ) NNG; low temperature path 2A, from one end into liquefied nitrogen (LN 2 ) LN (for example, -196°C); mixing path 3A, for the mixed gas and low-temperature nitro...

no. 2 approach ）

[0074] Next, a second embodiment of the present invention will be described. figure 2 It is a system diagram of the second embodiment of the low-temperature gas supply device, the heating medium cooling device, and the low-temperature reaction control device of the present invention.

[0075] Such as figure 2 As shown, the cryogenic gas supply device 100B according to the second embodiment of the present invention is provided with a normal temperature path 1B, and a normal temperature nitrogen gas (GN 2 ) NNG; low temperature path 2B, from one end into liquefied nitrogen (LN 2 ) LN (for example, -196°C); the mixing path 3B, for the flow of low-temperature nitrogen refrigerant described later; the first heat exchanger 5B, through which the normal-temperature nitrogen gas NNG introduced from the normal-temperature path 1B and the liquefied nitrogen gas introduced from the low-temperature path 2B Nitrogen and LN perform heat exchange with each other, and are discharged as gas...

no. 3 approach ）

[0090] Next, a third embodiment of the present invention will be described. image 3 It is a system diagram of the third embodiment of the low-temperature gas supply device, the heating medium cooling device, and the low-temperature reaction control device of the present invention.

[0091] Such as image 3 As shown, the low-temperature gas supply device 100C according to the third embodiment of the present invention includes: a normal-temperature path 1C through which a normal-temperature nitrogen gas (GN 2 ) NNG; low temperature path 2C, from one end into liquefied nitrogen (LN 2 ) LN (for example, -196°C); mixing path 3C, for the flow of the mixed gas and low-temperature nitrogen refrigerant described later; ejector (mixing mechanism) 4C, mixing the normal temperature nitrogen NNG introduced from the other end of the normal temperature path 1C and from The gas resulting from the gasification of liquefied nitrogen LN (hereinafter referred to as "liquefied nitrogen gasifica...

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Abstract

This low temperature gas supply device is provided with: a first heat exchanger; a mixing means; and a first control means. The first heat exchanger discharges a mixed gas as a low temperature gas coolant and discharges a low temperature-liquefied gas as a vaporized gas by introducing said low temperature-liquefied gas and the mixed gas, which is the vaporized gas of the low temperature-liquefied gas mixed with a gas of a temperature higher than the low temperature-liquefied gas, and causing same to exchange heat with each other. The mixing means mixes the gas with the vaporized gas discharged from the first heat exchanger and discharges same as a mixed gas. Based on the difference between the temperature detected for the low temperature gas coolant and the intended temperature, the first control means adjusts the respective amounts of the gas and the vaporized gas introduced into the mixing means and regulates the temperature of the low temperature gas coolant to the intended temperature.

Description

technical field [0001] The invention relates to a low-temperature gas supply device, a heating medium cooling device and a low-temperature reaction control device. [0002] this application claims priority based on Japanese Patent Application No. 2011-223716 for which it applied to Japan on October 11, 2011, and uses the content here. Background technique [0003] In chemical reaction processes such as organic synthesis and crystallization, high-precision temperature control in low-temperature regions is required. Therefore, as shown in the patent documents mentioned later, a low-temperature reaction apparatus may be used. In the above-mentioned low-temperature reaction device, a double-layer structure container is provided with an independent tank (sleeve) through which the heating medium can flow outside the reaction tank, and the temperature-controlled low temperature is supplied to the sleeve part. Heat carrier, so as to cool the reaction liquid inside the reaction tan...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): F25D9/00B01F3/02F25D3/10B01F23/10
CPCF25D3/10F25J1/00F25J5/00F25J5/002
Inventor 山住成正米仓正浩武内雅弘
Owner NIPPON SANSO CORP
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