Preparation method of super-hydrophobic meshy material
A super-hydrophobic, mesh-like technology, applied in separation methods, chemical instruments and methods, liquid separation, etc., can solve the problems of membrane fouling, high cost, complicated operation, etc., and achieve controllable experimental parameters, low cost, and simple operation. Effect
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specific Embodiment approach 1
[0022] Specific implementation mode 1: In this implementation mode, a superhydrophobic reticular porous film is prepared according to the following steps:
[0023] In the first step, the mesh-like porous Cu film was prepared by the hydrogen bubble template method ( figure 2 )
[0024] Electrodeposition of network porous Cu thin films by hydrogen bubble template method is based on platinum sheet (1cm 2 ) as the anode, and the counter electrode uses copper mesh (aperture 300μm, area 3*3cm 2 ) is the cathode, and its electroplating device such as figure 1 shown. The pretreatment of the copper mesh in the experiment includes polishing, degreasing, acid etching, water washing, absolute ethanol soaking, acetone cleaning, and low-temperature blast drying. The composition of the plating solution is 0.02-4mol L -1 CuSO 4 and 0.1-5mol L -1 h 2 SO 4 , the pH is controlled within the range of 4.0±0.5, and the current density range of electrodeposition is 0.1-6.0A cm -2 , the de...
specific Embodiment approach 2
[0028] Specific embodiment two: In this embodiment, a superhydrophobic mesh porous film is prepared according to the following steps:
[0029] Step 1. Preparation of mesh-like porous Cu film by hydrogen bubble template method
[0030] Electrodeposition of network porous Cu thin films by hydrogen bubble template method is based on platinum sheet (1cm 2 ) as the anode, and the counter electrode uses copper mesh (aperture 300μm, area 3*3cm 2 ) is the cathode. The pretreatment of the copper mesh in the experiment includes polishing, degreasing, acid etching, water washing, absolute ethanol soaking, acetone cleaning, and low-temperature blast drying. The composition of the plating solution is 0.1mol L -1 CuSO 4 and 1mol L -1 h 2 SO 4 , the pH is controlled within the range of 4.0±0.5, and the current density of electrodeposition is 3A cm -2 , the deposition time is 10s. The deposited reticular film should be immediately rinsed with distilled water, soaked in absolute ethan...
specific Embodiment approach 3
[0034] Specific embodiment three: In this embodiment, a superhydrophobic reticulated porous film is prepared according to the following steps:
[0035] Step 1 Fabrication of reticulated porous Cu thin films by hydrogen bubble template method
[0036] Electrodeposition of network porous Cu thin films by hydrogen bubble template method is based on platinum sheet (1cm 2 ) as the anode, and the counter electrode uses copper mesh (aperture 300μm, area 3*3cm 2 ) is the cathode. The pretreatment of the copper mesh in the experiment includes polishing, degreasing, acid etching, water washing, absolute ethanol soaking, acetone cleaning, and low-temperature blast drying. The composition of the plating solution is 0.2mol L -1 CuSO 4 and 1mol L -1 h 2 SO 4 , the pH is controlled within the range of 4.0±0.5, and the current density of electrodeposition is 3A cm -2 , the deposition time is 10s. The deposited reticular film should be immediately rinsed with distilled water, soaked i...
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