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A kind of high refractive index conductive film material titanium oxide and preparation method thereof

A technology of titanium oxide and conductive thin film is applied in the field of high refractive index conductive thin film material heptatitanium oxide and its preparation, which can solve the problems of high price, performance comparable to ITO, depletion of indium resources and the like, and achieves low cost and simple production. Effect

Active Publication Date: 2017-01-04
FUJIAN ACETRON NEW MATERIALS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] With the development of industries such as liquid crystal displays, touch screens, and semiconductors, the conductive film material indium tin oxide (ITO) has become more and more widely used and used more and more. However, due to the high price of indium in ITO materials and the lack of indium resources Will be gradually exhausted, other non-ITO series materials such as graphene, indium oxide, tin oxide and other materials, these materials cannot compare with ITO in performance

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0019] The raw materials TiO2 and Ti are mixed according to the ratio of Ti:O=1.68, mixed evenly, and then the above mixture is processed into a certain specification shape with a press, and then the semi-finished product obtained is placed in a vacuum sintering furnace, and the vacuum is evacuated to 10-3Pa. When the temperature rises to 1600°C, keep it for 4 hours and then start to cool down to prepare a titanium oxide material. Vacuumize the prepared material evaporation coating equipment or sputtering target equipment, fill it with protective gas, evaporate the titanium oxide material at a rate of 1-10 angstroms / second or sputter physical vapor deposition (PVD) to On the substrate, a transparent coating with a thickness of 10-300nm is prepared, and the prepared thin film coating has high refractive index, transparent and conductive performance.

Embodiment 2

[0021] The raw materials TiO2 and Ti are mixed according to the ratio of Ti:O=1.75, mixed evenly, and then the above mixture is processed into a certain specification shape with a press, and then the semi-finished product obtained is placed in a vacuum sintering furnace, vacuumed to 10-3Pa, When the temperature rises to 1500°C, keep it for 6 hours and then start cooling to prepare a titanium oxide material. Then, the titanium oxide material is vacuum evaporated to prepare a thin film coating, and the prepared thin film coating has high refractive index, transparent and conductive properties.

Embodiment 3

[0023] The raw materials TiO2 and Ti are mixed according to the ratio of Ti:O=1.80, mixed evenly, and then the above mixture is processed into a certain specification shape with a press, and then the semi-finished product obtained is placed in a vacuum sintering furnace, and the vacuum is evacuated to 10-3Pa. When the temperature rises to 1700°C, keep it for 3 hours and then start cooling to prepare a titanium oxide material. Then, the titanium oxide material is vacuum evaporated to prepare a thin film coating, and the prepared thin film coating has high refractive index, transparent and conductive properties.

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Abstract

The invention discloses a high-refractive index conductive thin film material titanium oxide, which has a chemical formula TiOx, wherein x is 1.68 to 1.80. A preparation method for the high-refractive index conductive thin film material titanium oxide comprises the following steps of uniformly mixing raw materials titanium oxide and Ti according to TiOx, wherein x is 1.68 to 1.80; forming a required shape in a hot-press forming or cold-press forming way; placing the mixture in a crucible or a special tool, transferring the crucible or the special tool into a vacuum sintering furnace, vacuumizing the whole system, raising the temperature to 1,400 to 1,800 DEG C, preserving heat for 2 to 8 hours at the highest temperature, and starting cooling to prepare the titanium oxide material. The transparent conductive thin film material titanium oxide is easy to prepare and low in cost.

Description

[0001] 【Technical field】 [0002] The invention belongs to the field of vacuum thin-film materials, and in particular relates to a high-refractive-index conductive thin-film material heptatitanium oxide and a preparation method thereof. [0003] 【Background technique】 [0004] With the development of industries such as liquid crystal displays, touch screens, and semiconductors, the conductive film material indium tin oxide (ITO) has become more and more widely used and used more and more. However, due to the high price of indium in ITO materials and the lack of indium resources Will be gradually exhausted, other non-ITO series materials such as graphene, indium oxide, tin oxide and other materials, these materials cannot be compared with ITO in performance. [0005] Tetratitanium heptoxide, as a wide-band, high-refractive-index, and conductive material, can be synthesized from titanium oxide, which is rich in resources and low in price, and can be used as an excellent substitut...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L31/18C03C17/23
CPCY02P70/50
Inventor 陈钦忠陈本宋
Owner FUJIAN ACETRON NEW MATERIALS CO LTD
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