Method of producing hydrogen chloride

A manufacturing method, hydrogen chloride technology, applied in hydrogen chloride preparation, chlorine/hydrogen chloride, chloride preparation, etc., can solve problems such as poor energy efficiency

Inactive Publication Date: 2014-04-09
SUMITOMO SEIKA CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Therefore, in the conventional production method, only the production method with poor energy efficiency, which recovers the hydrogen chloride gas of the reaction product as hydrochloric acid and then distills and dehydrates it from hydrochloric acid to obtain hydrogen chloride gas, has been put into practical use.

Method used

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  • Method of producing hydrogen chloride
  • Method of producing hydrogen chloride

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1）

[0066] A cylindrical flask made of heat-resistant glass with a diameter of 20 cm and a height of 50 cm provided with two inlets for raw material gas at the upper part and one outlet for the reaction product at the lower part was used as the photoreactor 2 . The raw material gas is blown into the photoreactor 2 so that the raw material gas introduced from the raw material gas inlet port swirls in the circumferential direction on the upper part of the photoreactor 2 . The raw material gases were continuously supplied from the gas cylinders in the following supply amounts. The raw material hydrogen was supplied from one inlet at a flow rate of 6 NL / min. A mixed gas of chlorine gas and hydrogen chloride gas was supplied from another inlet at a flow rate of 5 NL / min for chlorine gas and 120 NL / min for hydrogen chloride gas. The unit "NL / min" is a flow unit expressed by the volume (liter) that the gas in the standard state flows per minute.

[0067] In the center of the photoreact...

Embodiment 2）

[0069] Instead of arranging a high-pressure mercury lamp as a light source in the photoreactor 2 , it was arranged outside the photoreactor 2 and light was irradiated from the outside, and the procedure was carried out in the same manner as in Example 1. A 100W high-pressure mercury lamp (M-102, manufactured by Ushio Electric Co., Ltd.) was arranged at a distance of 1 m from the center of the photoreactor 2 . The temperature of the raw material gas was 30°C, and the temperature of the mixture containing hydrogen chloride gas derived from the photoreactor 2 after the reaction was 190°C. The composition of the mixture derived from the photoreactor 2 was 0.7 vol % of hydrogen, 99.3 vol % of hydrogen chloride, and 50 ppm of chlorine.

Embodiment 3）

[0071]The same procedure as in Example 2 was carried out except that the flow rate of introduced hydrogen gas was 16.5 NL / min, the flow rate of chlorine gas was 15 NL / min, and the flow rate of hydrogen chloride gas was 120 NL / min. The temperature of the raw material gas was 30°C, and the temperature of the mixture containing hydrogen chloride gas derived from the photoreactor 2 after the reaction was 480°C. The composition of the mixture derived from the photoreactor 2 was 1.0 vol % of hydrogen, 99.0 vol % of hydrogen chloride, and no chlorine was observed.

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Abstract

The invention relates to a method of producing hydrogen chloride. The purpose of the invention is to provide a method of producing hydrogen chloride that can inhibit temperature rising of a reaction system through more simple steps. According to the producing method, hydrogen and chlorine are irritated in the existence of hydrogen chloride gas, and the hydrogen chloride gas is generated because of reaction between hydrogen and chlorine.

Description

technical field [0001] The present invention relates to a method for producing hydrogen chloride by reacting hydrogen gas and chlorine gas to produce hydrogen chloride. Background technique [0002] Hydrogen chloride is used as an etching gas for dry etching of silicon semiconductors and for cleaning of growth furnaces for silicon wafers. In addition, in recent years, it has also been used for silicon carbide applications, and its use in the field of semiconductors has broadened. In the field of semiconductors, since the mixing of impurities will greatly reduce the yield, it is most necessary to avoid the mixing of impurities in each process, and all compounds used in the process require high purity. Furthermore, it is also required to be able to manufacture at low cost. [0003] As a method of obtaining hydrogen chloride by reacting hydrogen and chlorine, there is a method of directly producing hydrogen chloride by burning chlorine in hydrogen as shown in the following fo...

Claims

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Application Information

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IPC IPC(8): C01B7/01
CPCB01J19/08B01J19/081C01B7/01C01B7/012C01B7/015C01B7/017C01B7/04
Inventor 桑名晃裕畑启之坂本纯一小林晃德
Owner SUMITOMO SEIKA CHEM CO LTD
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