Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Defect detecting apparatus, defect correction device and defect detecting method

A defect detection and defect technology, applied in the direction of optical test defects/defects, optics, instruments, etc., can solve the problems of complex and expensive optical systems

Active Publication Date: 2014-03-12
NTN CORP
View PDF8 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the case of loading a laser, the optical system becomes complicated, making it an expensive structure

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Defect detecting apparatus, defect correction device and defect detecting method
  • Defect detecting apparatus, defect correction device and defect detecting method
  • Defect detecting apparatus, defect correction device and defect detecting method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0037] Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the following description, the same reference numerals are assigned to the same components. Their names and functions are also the same. Therefore, detailed descriptions about them are not repeated.

[0038] [device structure]

[0039] figure 1 It is a figure which shows the overall structure of the defect correction apparatus 100 in this embodiment. The defect correction device 100 includes: a correction head composed of an observation optical system 31, a CCD (Charge Coupled Device) camera 32, a laser device 33 for cutting, an ink coating mechanism 34, and a light source for ink curing. 35 constitutes; Z-axis worktable 36, and this Z-axis worktable 36 moves this correcting head in the direction (Z-axis direction) perpendicular to the liquid crystal color filter substrate 5 of correction object; X-axis worktable 37, this The X-axis table 37 mounts the Z-axis tabl...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A defect detecting apparatus of the present invention includes: a camera that shoots a baseplate and outputs an electrical signal; and an image processing apparatus, the electrical signal outputted from the camera is inputted into the image processing apparatus. The image processing apparatus uses a larger picture contrast of signal selected from a plurality of electrical signals to detect a defect portion of the baseplate. Because of this, even the defect portion with small contrast that exist before the distinction of signals can be detected without a lower sensitivity.

Description

technical field [0001] The invention relates to a defect detection device, a defect correction device and a defect detection method, in particular to a technology for detecting defects of repeated patterns formed on a substrate. Background technique [0002] In a production line of TFT (Thin Film Transistor: Thin Film Transistor) substrates for liquid crystal displays (LCD: Liquid Crystal Display), etc., defect correction devices for correcting defects in TFT substrates are used. There are various sizes of defects to be corrected. In particular, in TFT substrates on which circuits such as transistors are mounted, there are cases where the size of the target defect is several μm. Therefore, inspection with a high-resolution lens is desired. [0003] In addition, as a representative liquid crystal display, as the size of FPD (flat panel display: flat panel display) advances, the pixel size is also increasing. Japanese Patent Application Laid-Open No. 2011-203710 (Patent Doc...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G01N21/88G02F1/13
Inventor 大庭博明
Owner NTN CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products