Nano embossing press

An embossing machine and nanotechnology, applied in the direction of optomechanical equipment, optics, instruments, etc., can solve problems such as uneven pressure distribution, product defects, graphic deformation, etc., and achieve the effect of ensuring flatness, low cost, and press-in balance

Inactive Publication Date: 2014-01-22
WUXI IMPRINT NANO TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] The traditional nanoimprinting technology generally has uneven and unbalanced pressure distribution, and the imprinted graphics are deformed, resulting in product defects

Method used

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  • Nano embossing press

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Embodiment Construction

[0016] The present invention will be further described below in conjunction with the accompanying drawings.

[0017] Such as figure 1 The nanoimprinting machine shown includes an ultraviolet light source 1, a vacuum chamber 2, a pressure plate 3, a stage 4, a heating plate 5, a leveling device 6, and a high-pressure chamber 7; the high-pressure chamber 7 is installed in the vacuum chamber 2. The inner bottom and the high-pressure chamber 7 are connected with the leveling device 6, the heating plate 5 and the stage 4 in sequence through the rotating shaft 8. The upper end of the stage 4 is provided with a pressure plate 3;

[0018] The use steps of the present invention include:

[0019] a) Place the sample to be imprinted on the stage 4;

[0020] b) Vacuumize the vacuum chamber 2;

[0021] c) Pressure is added to the high-pressure chamber 7, and under the action of the leveling device 6, the sample is evenly pressed on the pressure-bearing plate 3;

[0022] d) The heating ...

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PUM

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Abstract

The invention discloses a nano embossing press. The nano embossing press comprises a vacuum cavity (2) and a high-pressure bin (7) arranged on the bottom in the vacuum cavity (2), wherein a leveling device (6), a heating disc (5) and an object carrying table (4) are sequentially arranged on the high-pressure bin (7); a bearing plate (3) is further arranged at the upper end of the object carrying table (4). The nano embossing press provided by the invention sufficiently utilizes pressure gas in the high-pressure bin to ensure balanced and uniform pressing-in of an embossing template; the leveling device can be used for ensuring flatness of the embossing template and an embossing base plate. Besides, the nano embossing press is simple in structure, low in cost and suitable for popularization and application.

Description

technical field [0001] The invention relates to the field of nanoscale structure and device processing, in particular to a nano imprinting machine. Background technique [0002] The traditional nanoimprinting technology generally suffers from uneven and unbalanced pressure distribution, and the embossed graphics are deformed, resulting in product defects. Contents of the invention [0003] Purpose of the invention: In order to overcome the deficiencies in the prior art, the nanoimprinter provided by the invention [0004] Technical solution: In order to solve the above technical problems, the technical solution adopted in the present invention is: a nanoimprinting machine, including a vacuum chamber, a high-pressure chamber installed at the bottom of the vacuum chamber, and a leveling device and a heating plate are arranged on the high-pressure chamber in turn. And the stage, the upper end of the stage is also provided with a pressure plate. [0005] Further, the top of ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/00
Inventor 王晶
Owner WUXI IMPRINT NANO TECH
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