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Zinc oxide sintered compact, sputtering target, and zinc oxide thin film

A zinc oxide film and sputtering target technology, applied in the field of sputtering targets, can solve the problem of easy cracking of the target, achieve high transmittance, suppress cracking, and improve productivity.

Active Publication Date: 2013-08-14
TOSOH CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In this way, when the flexural strength of the target is low, the target becomes prone to cracking in the sputtering method

Method used

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  • Zinc oxide sintered compact, sputtering target, and zinc oxide thin film
  • Zinc oxide sintered compact, sputtering target, and zinc oxide thin film
  • Zinc oxide sintered compact, sputtering target, and zinc oxide thin film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1）

[0126] Commercially available zinc oxide powder and zirconia powder satisfying JIS 1 standard were dry-mixed for 16 hours in a 10 L nylon kettle using resin balls with iron cores having a diameter of 15 mm by a rotary ball mill. Thus, 2000 g of mixed powder having a zirconium content of 45 ppm was obtained. Next, the particle size of the mixed powder was adjusted using a 500 μm sieve to finally obtain about 1990 g of the mixed powder. Table 1 shows the physical properties of the powder after particle size adjustment.

[0127] Put 600g of the obtained powder into a 150mmφ metal mold, and use 300kgf / cm 2 (29.42 MPa) was press-formed to obtain a disc-shaped compact. A total of 3 molded bodies were produced in the same manner. 3 pieces of molded body at 3000kgf / cm 2 (294.2MPa) CIP treatment was implemented.

[0128] The molded body was heated up to 500°C at a rate of 50°C / h, and from 500°C to 1100°C at a rate of 20°C / h. After keeping at the calcination temperature of 1100° C...

Embodiment 2）

[0143] A compact was produced in the same manner as in Example 1 except that the mixing ratio of the zinc oxide powder and the zirconia powder was changed so that the content of zirconium was 20 ppm, 45 ppm, and 1000 ppm. Three types of molded bodies (numbers 2, 3, and 4 in Table 1) having different zirconium contents were prepared respectively. Table 1 shows the physical properties of the mixed powder after particle size adjustment.

[0144] The molded body was heated up to 500°C at a heating rate of 50°C / h, from 500°C to 1100°C at a heating rate of 20°C / h, and kept at a firing temperature of 1100°C for 3 hours. Then, the temperature was lowered at a cooling rate of 100° C. / h to obtain a zinc oxide sintered body. Baking was carried out under the condition of gas flow parameter = 1.8 in a nitrogen atmosphere. The firing conditions are shown in Table 2. As shown in Table 2, the success rate up to firing was 100% in all the samples of Nos. 2 to 4. In addition, the physical p...

Embodiment 3）

[0158] 15 kg of commercially available zinc oxide powder satisfying JIS 1 standard was mixed with pure water to form a slurry. Dispersion treatment was performed with a wet bead mill device in a state where the concentration of the zinc oxide powder in the slurry was 50% by weight. The container of the device was made of zirconia, and 0.3 mm zirconia beads were also used as beads.

[0159] The slurry treated by the wet bead mill device was collected and spray granulated. Since the addition amount of zirconium can be increased by prolonging the pulverization time in the wet bead mill apparatus, three types of powders having different zirconium contents were prepared by changing the pulverization time. The contents of zirconium in the prepared powders were 15 ppm, 33 ppm and 120 ppm, respectively. The physical properties of each powder are shown in Table 1, and a powder with high fluidity was obtained.

[0160] Put 600g of the obtained powder into a metal mold with a diameter...

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Abstract

Provided are a zinc oxide sintered compact with a zirconium content of 10-1,000 ppm and a sputtering target comprising the zinc oxide sintered compact. Also provided is a zinc oxide thin film with a zirconium content of 10-2,000 ppm and a resistivity of 10 Omega.cm or more.

Description

technical field [0001] The present invention relates to a zinc oxide sintered body used as a raw material when producing a zinc oxide thin film by a sputtering method, a sputtering target formed from the zinc oxide sintered body, and a zinc oxide thin film. Specifically, it relates to a zinc oxide thin film capable of producing high resistance by a sputtering method, a zinc oxide sintered body having high strength and low resistance, a sputtering target formed of the zinc oxide sintered body, and a zinc oxide thin film. Background technique [0002] Zinc oxide is a white powder having a hexagonal crystal structure, and has been used in various applications in the form of a thin film in recent years. As a method for forming the zinc oxide thin film, there are physical vapor deposition methods such as vacuum vapor deposition and sputtering, chemical vapor deposition such as CVD, and the like. As a method for forming a zinc oxide thin film, a sputtering method is widely used b...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C04B35/453C23C14/08C23C14/34H01L21/363
CPCC04B35/645C04B2235/3246C04B2235/6562C04B2235/5409C23C14/3407H01L21/02631C04B2235/608C04B2235/786C04B2237/34C04B2235/5445C04B2235/404C23C14/086C04B2235/6565C04B2235/9653C04B2235/725C23C14/3414C04B2235/3284C04B2235/77C04B2237/407H01L21/02554C04B2235/604C04B2235/3244C04B2235/6586C04B37/026H01L21/02581C04B2235/5436C04B35/453C04B2237/12H01B1/08
Inventor 召田雅实仓持豪人饭草仁志尾身健治涩田见哲夫
Owner TOSOH CORP
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