Method for purifying diamond or cubic boron nitride abrasive
A technology of cubic boron nitride and hexagonal boron nitride, which is applied in the fields of diamond, chemical instruments and methods, and nitrogen compounds, can solve the problems of low processing efficiency, high cost, and a large amount of space, so as to achieve full response, reduce labor costs, Power Saving Effect
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Embodiment 1
[0010] The purification method of the present embodiment is as follows: 100 kilograms of cubic boron nitride plus 50 kilograms of sodium hydroxide and 25 kilograms of potassium hydroxide are put into the reactor and stirred, and the internal temperature and temperature are set by the temperature controller and the heating power controller. External process parameters, control the reaction process and reaction state, keep the internal temperature up to 130°C, turn off the heating system for 4 hours, release the product through the discharge port, and complete the dilution according to the conventional cleaning method. The total content of pyrophyllite silicate, hexagonal boron nitride and silicon oxide impurities is less than 0.1%.
Embodiment 2
[0012] The purification method of this embodiment is as follows: 110 kg of cubic boron nitride containing pyrophyllite silicate, hexagonal boron nitride, and silicon oxide plus 55 kg of sodium hydroxide and 27.5 kg of potassium hydroxide are put into the reaction kettle and stirred , set the internal and external process parameters through the temperature controller and heating power controller, control the reaction process and reaction state, keep the internal temperature up to 140 ℃, turn off the heating system for 3 hours, release the product through the discharge port, and follow the conventional cleaning method Dilution is complete. The total content of pyrophyllite silicate, hexagonal boron nitride and silicon oxide impurities is less than 0.1%.
Embodiment 3
[0014] The purification method of the present embodiment is: add 120 kilograms of cubic boron nitride containing pyrophyllite silicate, hexagonal boron nitride and silicon oxide to 60 kilograms of sodium hydroxide and 30 kilograms of potassium hydroxide, and put it into the reaction kettle for stirring. Set the internal and external process parameters through the temperature controller and heating power controller, control the reaction process and reaction state, keep the internal temperature up to 150°C, turn off the heating system in 2 hours, release the product through the discharge port, and complete it according to the conventional cleaning method Just dilute. The total content of pyrophyllite silicate, hexagonal boron nitride and silicon oxide impurities is less than 0.1%.
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